The Preparation Of Indium Tin Oxide Nanopowders

Indium tin oxide nano powder is a kind of High degenerate and tin doped n typesemiconductor materials, It’s widely used in the preparation of transparent conductive filmsbecause of its good optical properties. At present, magnetron sputtering is one of the mainmethods for preparing transparent conductive indium tin oxide films.But the nano powderwith good dispersion, small particle size and other good properties is the basic materials forpreparing excellent performance of ITO transparent conductive film. In this experiment,improving dispersion and particle size of ITO nano powder as a starting point to preparehomodisperse, small particle and crystalline ITO nano powder.In this experiment, the Indium ingot with the purity of4N and SnCl4.5H2O were usedas raw material and NH3.H2O was used as precipitant, ITO nano powder with goodperformance was prepared by hydrothermal method and solid-phase method. During theexperiment, the main factors which affect the major properties of the powder dispersion werestudied, such as dispersion media, the firing temperature etc. Modern testing methods wereused to characterize the powder, such as XRD, TEM,DTA, EDA.The materials were processed at200℃and260℃with hydrothermal treatment whichobtained by coprecipitation, None of them obtained ITO powder that needed. Then calcinedthe powders that processed with hydrothermal treatment at290℃and500℃，the cubic ITOpowders were obtained.The research indicates that it can obtained ITO powderat Lowercalcination temperature after hydrothermal treatment.It helps to form cubic ITO powders bymixing Mineralizer.In this experiment, the cubic ITO powders with small particle size and disperses evenwere obtaind by calcining the mixture of NaCl and ITO precursor. The study found that it cansignificantly improved the dispersion of ITO powders and ruduce the particle size by addingNaCl to ITO precursor before calcining.