The Magnetron Sputtering Preparation、the Structure And Optical Performance Of The Vanadium Dioxide Thin Films

Vanadium dioxide is a kind of smart thermochromic materials, which shows afully reversible semiconductor-metal phase transition characteristic at a criticaltemperature (Tc) of68℃. Vanadium oxide films are widely used in automobile,infrared detection, photoelectric switch, optical memory, etc. Due to the change of theinfrared transmittance before and after the phase, vanadium dioxide has become thefirst choice material to preparation of intelligent temperature control window.This experiment adopted two kinds of different target materials to thepreparation of VO2thin films:1.Using V2O5ceramic with soda-lime-silica glassunder the condition of rf magnetron sputtering, sputtering SiOxthin film first and thensputtering VOxthin film, finally got thin film sputtering in the annealing furnace forhigh temperature heat treatment, eventually got vanadium dioxide thin film;Preparation was studied through control different oxygen and preparation of barrierlayer of SiOxprocess, finding the influence on the phase structure of vanadiumdioxide thin film and the optical properties.2. Using a metal target under thecondition of dc magnetron sputtering，V thin film was got with soda-lime-silica glasssputtered SiOxthin films in no reaction gas oxygen sputtering and V2O5thin film wasgenerated with quartz glass in the reaction gas oxygen sputtering. Put the sputteringfilms in a certain oxygen content under high temperature annealing furnace and Arprotective atmosphere heat treatment of high temperature annealing furnace withoxidation and reduction treatment， respectively. Finally a phase transitioncharacteristic of vanadium dioxide thin films was got. In the process of preparation ofV2O5thin films, we studied oxygen partial pressure, substrate temperature, andsputtering power on the properties of V2O5thin films. Using the annealing furnaceheat treatment in the process of preparation of VO2thin film, we studied the influenceon the crystalline phase, microstructure and optical properties of VO2thin films atdifferent heat treatment temperature, heat treatment time and heating rate. Theconclusions are as follows:(1) Increasing the barrier layer of the sputtering time and the substratetemperature can effectively prevent the diffusion of sodion; Using V2O5ceramic target can obtain VO2thin film successfully by rf magnetron sputtering. Themaximum visible light transmittance was23%and the highest transmittance at2000nm wavelength between low temperature and high temperature reached13%.(2) Using vanadium metal target at dc magnetron sputtering got V membranes.Then we put it in the annealing furnace oxide preparation of VO2thin films. Thehighest transmittance at2000nm wavelength between low temperature and hightemperature reached44%and the maximum visible light transmittance was15%.(3) Using metal vanadium target by dc magnetron got V2O5thin film at oxygenreaction sputtering, then in the Ar protective atmosphere of annealing furnacereduction preparation of high-performance VO2thin film. The highest transmittanceat2000nm wavelength between low temperature and high temperature reached61%and the maximum visible light transmittance was55%. This method can get betterproperties of VO2thin films than the thin film using V film in annealing furnaceoxidation，not only got a enhancement in the visible light transmittance, but alsostrengthened the phase change characteristic.