Sputtering Deposition And Vacuum Evaporation Of Zinc-based Alloy Thin Films

Porous material has become a kind of functional materials with great potentialapplication and used widely due to its excellent physical and mechanical properties.This paper studied the preparation of ZnSi and ZnNi alloy films, vacuumdezincification and wettabillity of films, on the basis of significant differences whithzinc and many other elements have on evaporation. Then the findings are as follow:ZnSi and ZnNi alloy films have been prepared by RF magnetronsputtering deposition. The reason of compositional difference between the film andmosaic target has been analyzed. The effect of substrate temperature and zinc contenton the morphology of the films has been studied. The research results show that: thearea ratio of Zn and Si in mosaic target is set from1:3to7:3, the ZnSi alloy filmswith zinc content from47%to82%have been obtained; the area ratio of Zn and Ni inmosaic target is set from3:17to7:3, the ZnNi alloy films with zinc content from21%to74%have been obtained. The empirical formulas of the target material area ratioand film content are summarized by analyzing experimental data. According to theformulas, it can be effective to control the Zn based alloy thin films components byadjusting the area ratio of materials in mosaic target.The substrate temperature hae been changed from30℃-200℃.With the increaseof substrate temperature, the grain size of ZnSi alloy thin films grows, and the filmsurface become more compact, but at the substrate temperature of200℃the film hasa large surface roughness due to grain growth too much. Increase the content of Zn infilms, on the surface of ZnSi film the spherical grains have been found, the surfaceroughness of the films increase. While the substrate temperature or content of Zn hasless effect on the morphology of the ZnNi films.The zinc contained in the ZnSi alloy films and ZnNi alloy films had been mostlyevaporated after vacuum evaporation (410-3Pa,60min) at600℃. After that the Sifilms and Ni films with porous structure can be obtained. The porosity increased withthe zinc content of ZnSi films and ZnNi films after vacuum evaporation. With theincrease in evaporation temperature, the size of micropores in the films increasedafter evaporation.The wetting behavior of mercury and distilled water on the flim surface has been studied. The results showed that: Before evaporation, the film surface hydrophobichas been enhanced as the film surface roughness increase. After evaporation, the filmsurface roughness of this two kinds of films increased, so the hydrophobic of the filmsurface has been more enhanced. But the effect of surface roughness onthe wettability of mercury drop at the two kind of film surface is small.