The Optimization Method Of Plasma Source Cathode Is Discussed And Designed

Plasma-assisted deposition is a major breakthrough in optical coating technology at home and abroad, the technology not only has the characteristics of energy-saving, do not cause environmental pollution, but also has more advantages in the large-scale manufacture of a variety of high-quality optical thin film. Plasma technology is mainly used is mainly used for plasma deposition, it retains the advantages of the traditional techniques of high deposition rate and a large area, and more importantly overcome the film structure loose and unstable performance deficiencies. It is expected to replace the optical thin films technology of new generation of traditional techniques. Foreign and domestic studies have shown that film structure of plasma-assisted deposition is dense and high mechanical strength, optical losses reached the best level of traditional technology. It is now widely used in the production of Germany Leybold APSpro, it makes the large-scale production of optical thin film quality is greatly improved. But the defect of the ion source is also obvious, LaB6 cathode material is expensive, and pollution is big.Therefore, we discuss the cathode discharge structure of plasma source in this paper.By choosing different structure of hollow cathode, the design can meet the needs of the industrial production and reduce the cost of the plasma source, also provide the reference for the same type of modification in the future or research and production of ion source of similar discharge principle.This paper is introduced according to the design of the plasma source and processes, mainly includes the following research contents:Firstly, the domestic and international development of the plasma source and plasma source design meaning and purpose, and thus the working principle of the plasma source and application have a full understanding.This paper introduces the development situation of plasma source at home and abroad, and the design meaning and purpose of the plasma source, then have a full understanding for the working principle and application of the plasma source.Secondly, determine the system component of plasma source, formulate parameters, chose two kinds of hollow cathode structure, and the discharge principle and structure of these two kinds of hollow cathode are analyzed and compared. Finally, improve cathode structure of APS source and complete discharge chamber design.Thirdly, the electric field and magnetic circuit system are simulated, by adopting the ANSYS software of finite element. By analyzing the different voltages, currents, electrode spacing, the impact of ventilation on the simulation results, electric field systems and magnetic system are optimized. Simulation results determine relevant parameters, and complete electromagnetic system design.Finally, by applying SIMION software of electrostatic lens to imitate, this paper eventually completed the structure design of the plasma sources which is based on the tube type structure of hollow cathode.