Ion Beam Assisted Vacuum Arc Deposition Of Nano-zrn And (zr, Me), N Films

It is known that Vacuum Arc Depositing has a high ability to be used as strong adhesion, rapid depositing speed, low depositing temperature and non-social effects of pollution and Ion Beam Assisted Depositing can gain compact and high quality films. Up to now, however, there is still lack of the research on superhard nano-films by IBAVAD at home, therefore it is investigated in detail that the research on superhard nano-films by IBAVAD in this paper; The surface morphology of the films were observed by Scan Electron Microscope( (SEM/EDS ) ); The phase structure of the films was determined by X-ray Diffiation(XRD); The micro-hardness of the films was tested by micro - hardness testing machine with ultra-loading; The adhesion was tested by nick-testing machine; The wear resistance was tested by surface property-testing machine; The hole ratio was tested by filter paper means. The experimental results showed that:The technical characteristic of Bulat-6 Vacuum Arc Depositing machine in depositing superhard nano-films is stable. The outstanding whole synthetical properties of films and the depositing stability are controllable with the optimized technical condition.(1) Vacuum degree and bias voltage have important influences on the microstructure and properties of ZrN films. Vacuum degree influences the preferred texture-orientation of ZrN films and bias voltage influences the microstructure of ZrN films. Its have better microhardness and adhesion that the ZrN films are deposited according to the combination of higher vacuum degree and lower bias voltage or the combination of lower vacuum degree and higher bias voltage;(2) IBAD have a stimulative function to microstructure and properties of ZrN films. Following the increase of ion beam and accelerative voltage, grain size is fined and microhardness is improved and wear resistance and adhesion gain melioration between 80 and 200 mA of ion beam and between 1500V and 4000V of accelerative voltage. The average grain size is 9.22 nm and the microhardness can reach 4142.6 HV0.025 and the best wholesynthetical properties of films can be gained when the ion beam is 150 mA and the accelerative voltage is 3500 V.(3) The fall of depositing temperature advantages the grain size to be fined and the compactness of ZrN film;(4) the multi-complex of Ti, Cr, W, AL et al can evidently fine the grain size of (Zr,Me)N films by IBAVAD. The XRD spectrum shows that ZrN (111) phase have remarkable broaden phenomenon. The properties-testing of multi-elements films show that multi-complex films have higher microhardness and wear resistance and have better adhesion. The microhardness can reach 4002 HV0.025 and the critical loading Lc is 44 N when the ion beam is 150 mA and accelerative voltage is 3500 V.The technique of IBAVAD ZrN system films have prominent effect on improvement of surface hardness and wear resistance and durability of tool and mold and other wearable part. It have widest application foreground on the field of metal cutting.