Microstructure And Properties Of-titanium-and Zirconium-based Multi-nitride Film

This article studied the (Ti_1-x-yAl_y S_xi)N and (Zr_1-xAl_x)N films prepared by Bulat-6 multi-arcs-ion films plating machine. The metallic composition, phase structure, mechanical performance, and oxidation-resistance were investigated by Electron Microscopy (SEM), X-Ray Diffraction(XRD), Microhardness Tester, Abrasion machine and Analytical balance. The influence of Si and Al on the structure and performance of the films were analyzed. The result indicated:Si in (Ti_1-x-yAl_ySi_x)N films prepared by AlSi(Si 2.1at.%) target and AlSi(Si, 5.6at.%) target were negative demising degree lowly. Si in the films prepared by AlSi(8.5at.%) target and Ion beam assisted deposition were positive demising. The orientations of (Ti_1-x-yAl_ySi_x)N films prepared by multi-arcs-ion films plating technology were (111), (200) and (222). (111) was the preferred orientation. With Al content increasing, the (111) and (222) orientation were weaken,(200) orientation was increased and diffraction peak moved to small angle. The orientation of (Ti_1-x-yAl_y Si_x)N films prepared by Ion beam assisted deposition was (200). The hardness, wear-resistance and oxidation-resistance of the films prepared by the two deposition technology increased with the increasing Al content. This is perhaps due to the change of preferred orientation and stress of the films.It was a effective method preparing (Zr_1-xAl_x)N films with different Al content through proportional governor controlling the Al content. The actual Al content in films was close to the design Al content. With the Al content of the films increased, the phase structure changed from BlNaCl to the mixture of B4ZnS and BlNaCl ,the orientation was increased and diffraction peak moved to small angle. The hardness and wear-resistance character of the films first increased then decreased with the increasing Al content, which is perhaps due to the change of phase, preferred orientation and stress of the films. Introduction of Al dramatically improved the oxidation-resistance of the (Zr_1-xAl_x)N films. With the increasing Al content, the oxidation-resistance of films increased. This is This is perhaps due to the forming of Al₂O₃ .