Design And Its Mechanism Of Chemical Assisted Ion Beam Etching Laboratory Equipment

CAIBE(Chemically Assisted Ion Beam Etching) belongs to the dry etching method.It can be used to microfabricate the sample. In this dry etching method reactive gas was used in the etching room and at the same time high energy ion beam from the ion source hit the sample. The etching rate can be improved largely for the assistance of the reactive gas and the ion beam etching is anisotropic. So to fabricate 2D photonic crystal by CAIBE is a better selection.In order to fabricate and study the photonic crystal in the laboratory we design a CAIBE system. In this thesis we first explain the design theory of the CAIBE system. The work on basic system structural design and the basic system parameters selection have been completed . The system we designed can satisfy the basic requirements of the fabrication of the photonic crystal . Then we expatiate the etching mechanism of the equipment. Finally we simulate the etching profile with a simple string model.Simulated results illustrate that the ratio of isotropic component to anisotropic component affects the etching profile significantly and the ion angle distribution of incidence modulates the etching profile as well.