Magnetron Sputtering Of Titanium Nitride Films

The TiN films have high hardness and good wear-resisting properties. TiN films are very fit for cutlery and layer of beatings. It can raise tool to good wear-resisting properties, and prolong the tool life span 3-500%.The TiN f'flms are unique golden yellow, which is used for decoration material. In the process of gaseous phase deposition, the low temperature deposition is the forerunner, for a long time, the low temperature deposition has been one of the target that the vacuum coating.The microstmcture, morphology, component and growth orientation of TiN films are affected regularly through controlling some parameters including deposition time, air pressure, nitrogen partial pressure, substrate temperature and bias voltage. At the same time the thesis also researches some properties of TIN films like microhardness. The thesis analyzes the intimate relationship between microstructure and property of TiN films. It provides evidence for producing high quality's TiN.We study the relation between the microstructure and property of TiN films. Aiming at the effects on the microstructure, growth orientation and properties of TIN fdms, the thesis would pay more attention to nitrogen partial pressure, substrate temperature, bias voltage and acquire some laws for them.The surface and strain energies of TiN films are researched to know how they affect the growth orientation of TIN films. At small film thicknesses the surface energy controls TIN films growth and a{100)preferred orientation is expected; at large film thicknesses the strain energy predominates and a {111} orientation is expected.