| Transparent-Shielding material is one kind of excellent material that has transparent and electromagnetic shielding properties at the same time. Thin film transparent-shielding material has a broad application prospects because of its advantage that has high transmittance, exterior appearance, non-diffraction interference. So how to acquire high performance transparent-shielding film is the focus of study now.ITO transparent-shielding film was prepared by DC matron sputtering on float glass substrates. Using an high-purity (99.99%) ITO ceramic target (wt.90%In2O3+wt.10%SnO2). The films were figured by scanning electron microscopy (SEM), X-ray diffraction (XRD), X-ray energy dispersive spectrometer (EDS), thickness tester, four-probe resistance tester, shielding effectiveness testing. It was concluded that:(1) Transparent shielding performance is closely related to substrate temperature,sputtering pressure of oxygen and film thickness. Film of best performance was obtained when substrate temperature at 350℃, argon-oxygen ratio at 0.5/50;SEM of ITO samples showed that the surface of the sample was leveled off, and the crystals were felsitic; Transmittance of ITO is more than 80%, resistivity is as low as 1.17×10-4? ? cm.(2) With the film thickness increased, the transmittance rate declined as shielding effectiveness increased. when film thickness is 200nm, shielding effectiveness is beyond 20dB at 150KHz~10GHz frequency bands, and the peak value reached about 50dB,transminttance is 88%, film has a good transparent-shielding properties.(3)ITO/SiO2/ITO film single-sided deposition on substrate,ITO film double-sided deposition on substrate,ITO thin film single-sided deposition on substrate, three cases had the same total ITO thickness. Transmittance of ITO multilayer films is lower than single-layer coating due to interface scattering increased; in multi-layer ITO thin films, shielding effectiveness increased as interface reflective loss increase. |
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