Multi-electrochemical Deposition Of Gaas Thin Films

In the light of the principle of electrochemistry , a series of experiments about the condition of GaAs films and AlGaAs films growth have been made by electrochemisuy deposition method .These experiments have been carried out with graphites as anode materials and conducting glass of tin dioxide ,stainless steel and aluminium foil of tin dioxide as cathode substrate materials in electrolyzers designed and made by ourselves and in the solution of compounded- simple sal. Topography ,structure and composition of films have been analysed and determined by x-ray diffractometer ,x-ray photoelectron spectroscope and Japan Daojing EPMA-1600 and EPMA-8705 electron microprobe and we have obtained the optimum electrochemistry deposition parameters which help the stoichiometry ratio of GaAs films to close to 1:1 and the x value to be what the Al,~Ga,~As1 films are hoped. The principle of electrochemistry deposition at the same time of two or more than two kind of element has been set forth in tenns of theory . The dependent relation of the composition of GaAs films with electrochemistry deposition parameters (solution density, PH value, ratio of ion density and cathode material) and the property of GaAs films have also been studied in this paper,which have laid the foundation for the materials of practical GaAs films to be obtained.