Physical Vapor Deposition Of Dlc And Tin-series Ultra-dura

The properties, preparations, characterizations and applications of diamond like carbon (DLC) film and TiN Superhard films were described briefly at first. Based on this, different surface morphology of diamond-like carbon film was deposited on Si, wafer by controlling the temperature of substrate, ambient pressure, sputtering power in DC magnetron sputtering, using multi-arc ion implantation, TiN'/TiAlN/TiN, TiN/TiAIN, TiN/TiNC multilayer were deposited by changing ambient gas and sputtering target. Atomic force microscope(AFM), X-ray diffraction (XRD), Scanning electron microscope(SEM), tension test was used to tes: these films. By analyzing the results, we made following conclusions: 1. The parameters in the DC magnetron sputtering have evident effect on the morphology of diamond-like carbon film. (1) The elevated temperature lead to a much rougher surface. Surface diffusion is promoted by the increase of temperature. Diffusion in the surface layers of DLC will ter.cto generate ordered clusters with high sp" contents, i. e. with structures closer to the thermodynamically stable graphite phase. More graphite phase the surface has, rougher the surface is; (2)The surface became rougher when the sputtering power increased. When the energy of an impinging ion exceeds the critical value for atomic displacement in the structure, surface diffusion is not promoted and the ion energy tends to be dissipated into a relatively large volume in the interior. The effect of sputtering moving was improved at the same time. The surface became smoother, on the contrary, when the energy of an impinging ion is lower than the critical value, diffusion in the surface is dominating and surface is rougher-, (3) Surface roughness increased with the increase of ambient pressure. It is related with the increase of collision of the im-planted particles which lead to the decease of the energy of the particles. 2. TiN/TiAlN/TiN, TiN/TiAIN, TiN/TiNCall have strong (111) prefertional oritetion. TiN/TiAlN/TiN have the highest hardness, followed by TiN/TiAIN, and TiN/TiNC is the lowest. These results are consistent with the formula proposed by E. Bemporad. For the system of hard film and soft substrate, the superhard films have no influence on the mechanical properties of whole system.