Metal Organic Chemical Vapor Deposition Heater Research

Metal organic chemical vapor deposition(MOCVD) is the critical equipment in the manufacturing of hybrid semiconductor devices, widely used in fabricating MOCVD i thin metal dioxide , thin metal nitride , and etc. for optoelectronic devices. Heating system is an important part of the MOCVD equipment. Whether it can heat the substrate rapidly and uniformly. It will directly impact the quality and the thickness of the deposition film, and the performance of the chip. Each different MOCVD chamber needs a heater which is needed to match the chamber.This thesis discussed the specific structure of MOCVD equipment and its assembly ,several kinds of the reactor and the heater structures of typical equipment at home and abroad were made comparative analysis ,summerized the advantages and disadvantages.The resistant plate form heater was thoroughly studied because of its better performance and more mature technology. This thesis used the finite element method and coupling simulation of fluid and thermal on the MOCVD heater, to design an resistant plate form heater matched the reaction chamber of buffered distributed spray system(BDS) .It can offer a large effective area evenly heated graphite. The performance of the heater in different flow environments and different temperature has been verified by simulation and run-test. This thesis also discussed some details of the structure of the heater, including the choice of the heater's resistance and power ,the specific structure of the heater, the heater of each component material selection, contact resistance, the thermal deformation influence .