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Research On The Chemical Mechanical Finishing With The Magnetic Driving

Posted on:2013-08-16Degree:MasterType:Thesis
Country:ChinaCandidate:Y J GuoFull Text:PDF
GTID:2231330371997625Subject:Mechanical and electrical engineering
Abstract/Summary:PDF Full Text Request
Traditional chemical polishing firstly make a chemical slurry with phosphoric acid, sulfuric acid, and nitric acid,then throw metal into it. When metal is polished, large amount of toxic gases will be produced and cause serious harm to the human body. There is more and more attention into the process, because The process can cause serious environmental pollutionSurface processing has an important significance to component life. Parts will have a good life if the parts have a good surface. So the finishing of the surface is very important for a part. In actual production because of the limitations of traditional finishing process, the surface of some small complex parts is very difficult to be finished.Through research and analysis on a variety of processes, a new finishing process has been designed, the chemical mechanical finishing with magnetic drive. This process makes the perfect combination of chemical polishing with magnetic abrasive. They can process a part in the same time and can complement each other’s defects. Environmentally friendly chemical polishing solution has been used, so no pollution gases will be produce and environment is protected. In the same time the surface of some small complex parts can be processed and processing efficiency has been improved. With the role of magnetic abrasive, the surface of processed workpiece will have residual stress, so the quality of workpiece surface will be strengthened.Environmentally friendly chemical polishing solution has been researched in the paper, includes NaOH, NaNO3, Na3PO4. Though the experiment, we found the effect of NaOH, NaNO3, Na3PO4and working conditions for metal removal rate, specular reflectance, pitting attack. The results showed that:NaOH in the metal removal rate play a leading role, NaNO3and Na3PO4mainly affect specular reflectance and pitting attack. The results provide an important basis for future research.
Keywords/Search Tags:Chemical polishing, Magnetic abrasive, Environmental protection, Chemical polishing liquid
PDF Full Text Request
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