Error Analysis Of Binary Optical Devices Surface Based On Scanning White Light Interferometry

With the binary optical element widely used in space technology, ultra-precisionmachining, MOEMS, computer technology, information processing, opticalcommunication, biomedical, defense and other fields, the measurement of binary opticelement and processing process control parameters becomes increasingly important.Binary optical device on the parameters of the surface quality of nano-scalenon-invasive test is the most important method to ensure the accuracy of itsproduction process to meet the performance requirements and the system. Amongthe many micro-optical surface profile measurement methodologies, scanning whitelight interferometry method has unique advantages, such as Micro-nano-levelaccuracy, and real-time three-dimensional non-contact measurement of speed, havingrelatively simple system structure, measurement of the low cost and so on.In this study, we use the scanning white light to interfere micro accept theinstrumentation to carry on the survey for the dual optical device sample surface, andstore the component group of the surface of the interference pattern in the computer’shard disk by CCD and OK image acquisition card; The second step is that deal withthe metrical data by using the fast spatial frequency range algorithm and the phasesolution wrap; Finally, we can calculate the sample surface height of each pixel value.On the one hand, we have been through the mathematical properties of the samplesurface texture, roughness, micro-profile, step height and width dimensions such assize of the surface parameters, and get the processing error of the surface throughhighly comparing the sample surface’s stair with the line width size and sampledesign’s primary data. On the other hand, used the scope parameter and the powerspectral density function attribute method has carried on the attribute to samplesurface other characteristics.