Nanometer Lithography And Thermal Cvd Growth Of Carbon Nanotubes Research

This paper consists of both:nano ball photolithography and carbon nanotube growth by Themal-CVD.The fist part of this paper wanted to prepare well ordered and closed-packed monolayer masks because this would be prerequisite for peparation of grid electrod of Spindt Cathod based on nanosphere lithography, as there were various problems in previous preparation methods of nanohole arrays.Self-assembly of monolayered mask was the base of nanophere lithography. The experiment considered almost all of methods of self-assembly. We modified the "pulling-mask"method and then preparaed a closed-packed,well-ordered and periodic monolayer masks with polystyrene nanospheres. In the paper, we summarized the parameters which effected the quality of monolayer masks. And what we did will be helpful for improving the preparation of monolayer.The remaining part of this paper works on the preparation study of Themal-CVD growth of carbon nanotubes. Analyze and experiment in growth mechanism, preparation technology and testing. Through Themal-CVD, we use Ethanol as carbon source grow CNTs in800℃. The CNTs grown by this way was capble in filed emission, and with good structure, uniform pattern and distribution and strong stability. As is known to all, the general Themal-CVD use dangerous chemical gas (acetylene, methane, etc.), has some of the security hidden danger. And we are not dangerous gases, the introduction of the increased the safety of the experiment. And, finally, the samples have very good field emission characteristics, and its emission current density59mA/cm2, at that time of the electric field is3.4V/μm. It has great application potential.