Magnetron Sputtering Method Ti Film And Its Modification Tio < Sub > 2 < / Sub > Structure And Properties Of Film Studies

With its advantages of stable nature, cheapness and no poison, TiO2is recognized as the excellent photocatalyst. However, its lower utilization of sunlight and the finite rate of degradation of pollutants limit its extensive use. Therefore, a lot of researches have been carried out to improve its utilization of sunlight and photocatalytic degradation rate.In this paper, the Ti thin films were prepared by magnetron sputtering. The influence of sputtering pressure, sputtering power, and sputtering time on the films structure and morphology was studied. And the films were characterized by Raman spectroscopy (Raman), X-ray diffraction spectroscopy (XRD), atomic force microscopy (AFM) and scanning electron microscope (SEM). The results showed that in the case of having no treatment, the magnetron sputtered Ti thin films was amorphous Ti. When the sputtering power was150W, the sputtering pressure was1.OPa, and the sputtering time was1h, the Ti films with small roughness and smooth surface could be prepared.The Ti thin film prepared by magnetron sputtering was treated through the methods of annealing oxidation and low-temperature hydrogen peroxide to prepare the TiO2thin films. As for the annealing method, the influence of annealing temperature and the process parameters of preparing the Ti films on TiO2thin films structure and surface morphology was studied. As for the low-temperature hydrogen peroxide method, the influence of deposition time of pretreating Ti films in the precursor solution and sputtering pressure on the films structure and surface morphology of TiO2thin films was discussed. Studies showed that the annealing temperature had a huge impact on TiO2polymorphs, when the annealing temperature was800℃, the films turned into rutile, the anatase TiO2thin films with the surface of smaller particle size could be prepared from the Ti films, the Ti films was made under the condition of150W sputtering power,1.OPa sputtering pressure,1h sputtering time, and was annealed in a500℃air atmosphere. And the anatase TiO2thin films with high surface area could be prepared from the TiO2films which was made under the condition of sputtering power150W, sputtering pressure0.5Pa, the sputtering time1h, then was pretreated in H2O2, and deposited in the precursor solution for12hours.Methyl orange solution was used as the degradation products to study the photocatalytic activity of TiO2films. The influence of the light source, the initial concentration of methyl orange solution and process parameters of TiO2thin films on photocatalytic effect was discussed respectively.