Research On Large Area Uniform Nano-film Detection Technique

Preparation of nano film for large area is the key technique in the large area lithography, the consistency and uniformity of nano film is particularly important. Preparation of PMMA nano film is researched by ultrasonic spray deposition in this thesis. At the same time, the testing methods for film are analyzed. This thesis focused on the preparation of the large area uniform nano film (LAUNF). A cheap and effective way for the preparation of the LAUNF was explored based on the ultrasonic atomization method technology. The quality of nano film is influenced by substrate material and environment factors. The nano manufacturing technology, especially the large area nano structures preparation technology is the main restricting of nano technology widespread use. The technology of large area nano film preparation will realize laser interference lithography of large area nano structures.With the widely application of the film materials, the tests of film properties and the thickness are particularly important. The thickness of the thin film influence optical properties, mechanical properties and electromagnetic properties, etc., so the accurate detection of film thickness has become a key technology. PMMA nano film can be produced by ultrasonic atomizing deposition technology. The structure and morphology of the film can be tested by AFM, as well as the thickness of thin film can be measured by laser interference method. PMMA nano film can be produced by ultrasonic atomizing deposition technology. The structure and morphology of the film can be tested by AFM, as well as the thickness of thin film can be measured by laser interference method.