Study On The Characteristics Of Low-power Planar Micro-strip Spiral Inductively-coupled Microwave Micro-plasma

Low-power planar micro-strip microwave micro-plasma is a kind of high technology based on micro-electronic, microwave and plasma. In the1830s, the plasma system was known. Until the early20th century, the concept of plasma had been established. The inductively-coupled plasma referred to as ICP is generated based on planar micro-strip dielectric substrate. The ICP is characteristic of small size, simple structure, admirable low igniting power, easy repetition and stable working conditions etc., so has a wide range of applications in MEMS sterilization, small size materials processing, micro-chemical analysis systems and particle detection, etc.In this thesis, ceramics was used as dielectric substrate in planar spiral resonator. The properties of the inductively-coupled microwave micro-plasma including input power, radiation spectrum, resonant frequency, S parameters, temperature and electromagnetic compatibility are obtained at different gas (air and argon) and the added magnetic field strength(360G,990G and2840G). Experimental results show that the operating gas has an influence on input power required to ignite and sustain the microwave micro-plasma as well as on the radiating spectrum. The resonant characteristic is consistent. The magnetic field strength and pole orientation have some influences on excitation of the microwave micro-plasma.Experimental results show that the input power required to ignite、sustain and extinguish micro-plasma in argon is slightly lower than in air. The magnetic pole orientation has also some influence on the igniting power and extinguish power. The magnetic field strength has no effects on the electromagnetic radiation. The planar spiral resonators are not contaminated by the micro-plasma in air and argon.