Electrodeposition And Properties Of Zn-doped Nickel Oxide Electrochromic Thin Film

Electrochromism （EC） is a phenomenon that materials can reversibly changetheir optical properties, including transmission, reflection and absorption, under anapplied electric field or an electrical change, it visually shows color andtransparency changes of the materials. Recently, EC materials become more andmore important and have been widely used in smart windows, display devices,glare-free mirrors, etc. researchs on the EC materials because of their attractiveprospects for applying in saving energy and environmental protection.Nickel oxide （NiO） is a kind of wide bang gap （3.6⁴.0eV） semiconductormaterial. It has the excellent properties such as gas sensitivity, thermal sensitivity,catalytic and electrochromic properties. It has attracted special attention due to theirgood dynamic range, cyclic reversibility, large capacity of ion storage and lowmaterial cost as a representative of the anode colored materials.In this thesis, Zn-doped NiO films were prepared on the surfaces of FTOglasses using electrochemical deposition method in N, N-dimehtyl formamide（DMF）. NiCl₂was used as main salt, ZnCl₂as dopant and LiClO₄as supportingelectrolyte. In order to obtain the optimizing process parameters, the effects ofparameters such as dosage, deposition voltage and deposition time on the propertiesof NiO films were studied systemly. The morphology, structure and electorchromicproperties of the optimal films were also characterized.Results show that, when Zn:Ni=1:8, the deposition time is15min anddeposition voltage is3.5V, the Zn-doped NiO film has excellent electrochromicproperties with T=88.63%and O D=1.063, tb/ts=2.60/2.46s and η=36.82cm²·C^-1.