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Effects Of Si Additions On The Glass Forming Ability And Corrosion Resistance Of Cu-Zr-Al Bulk Metallic Glass

Posted on:2014-04-06Degree:MasterType:Thesis
Country:ChinaCandidate:E L SuFull Text:PDF
GTID:2251330401990481Subject:Materials Science and Engineering
Abstract/Summary:PDF Full Text Request
As a new structural material with extremely potential applications, Cu-basedamorphous alloys have excellent mechanical properties and low cost of thepreparation. For the further practical application, it is one of the key issues to improvethe GFA of the Cu-based amorphous alloys, meanwhile, the superior properties werenot affected, such as the corrosion resistance. In this paper, Cu-Zr-Al amorphousalloys have been taken as the research objects. Based on the well known of thecorrosion resistance of these amorpous alloy, the metalloid element Si was added inthe Cu49Zr45Al6BMG. Then, the effects of Si additions on the GFA, the corrosionresistance and related mechanism of Cu49Zr45Al6have been studied. The main resultsare as follows:(1) In1mol/L HCl solution, compared with Cu49-xZr45Alx(x=6、8and10, inatom percent)alloy, the corrosion potential of amorphous alloys with the samecomposition is negative, but the current density is low. In3.5%mass NaCl solution,compared with Cu49-xZr45Alx(x=6、8and10, in atom percent)alloy, the corrosionpotential of amorphous alloys with the same composition ispositive and the currentdensity is also low. In the above two solutions, with the content of Al increasing, thecorrosion potential becomes negative. In0.5mol/L H2SO4solution, corrosion rate ofthe amorphous alloy is lower than that of the alloy with the same composition. Fromthe polarization curves, it can be found that amorphous alloy has ralertively lowercurrent density and passive current density. Cu49Zr45Al6amorphous alloy has mostpositive corrosion potential and smallest current density and passive current density,the values are-0.184V,1μA/cm2and1.54μA/cm2, respectively. In1mol/L HClsolution, Cu47Zr45Al8amorphous has the maximum impedance value. In3.5%massNaCl solution, the impedance value of Cu49Zr45Al6amorphous alloy is largest in allthe alloys.(2) The addition of0.5-1.0at%Si into the Cu49Zr45Al6BMG to partly substituteCu can increase both ΔTx and γ, indicating that the GFA of the BMG is promoted byadding Si to substitute Cu in the Cu49Zr45Al6alloy as the Si content equals or lowerthan1%. However, as the Si content is higher than1%, the GFA of the alloy decreases,and the2-3at%Si additions result in the formation of some intermetallics in the alloy.(3) The0.5-1.5%Si containing Cu-based BMGs exhibit lower corrosion rate andlower Ip, Icorrand higher Rp than Si-free Cu50Zr45Al6BMG in1mol/L HCl,3.5%massNaCl and0.5mol/L H2SO4solutions. Thus, the addition of0.5-1.5%Si can effectively promote the corrosion resistance of the Cu49Zr45Al6BMG in the three corrosion media.The improvement of the corrosion resistance may be attributed to the formation of thesilica containing passive layer on the surface of the BMG.(4)In the solution containing Cl-, Annealing treatment under the conditions of aappropriate temperature and soaking time improves the corrosion resistance ofCu48Zr45Al6Si1amorphous alloy.
Keywords/Search Tags:Bulk amorphous alloy, Microalloying, Glass forming ability, Corrosionbehavior, Electrochemical properties
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