Magnesium Alloy Sputtering Deposition Ta (N) / Ti-Si Multilayer Films And Their Properties

With the purpose of improving wear and corrosion resistance of magnesium alloys, DCmagnetron sputtering technology and high power pulsed magnetron sputtering technology wererespectively adoped to fabricate Ta film on the surface of magnesium alloy, and high powerpulsed magnetron sputtering technology was adoped to respectively fabricate Ta/Ti-Si4-layeralternate film, Ta/Ti-Si12-layer alternate film and Ta/Ti-Si8-layer, Ta-N/Ti-Si4-layer alternatefilm on the surface of magnesium alloy.Field Emission Scanning Elctron Microscope, Energy Dispersive X-Ray Spectroscope,Atomic Force Microscope and X-Ray Diffraction were employed to analysismicro-morphology and organization structure of coating, and the influence of different processparameters on wear and corrosion resistance of coating was studied. Scratches experiment,nanoindentation experiment, friction and wear experiment and electrochemical corrosionexperiment were adopted to evaluate film/substrate binding force, nano-hardness, wearresistance and corrosion resistance of film, and the influence of process parameters on corrosionresistance and wear resistance of the film was studied.Study results show that the phase structure of Ta film, Ta/Ti-Si4-layer film and Ta/Ti-Si12-layer film was mainly composed of α-Ta and β-Ta, and that the phase structure ofTa(N)/Ti-Si12-layer film was made up of TaN0.1, TaN0.8, Ta4N and β-Ta.Film/matrix binding force of Ta film fabricated with high power pulsed magnetronsputtering technology was higher than that of Ta film fabricated with DC magnetron sputteringtechnology.Hardness and modulus of Ta film fabricated with high power pulsed magnetron sputteringtechnology was higher than that of Ta film fabricated with DC magnetron sputteringtechnology.Ta single film improved corrosion resistance and wear resistance of magnesium alloy tosome degrees, while Ta(N)/Ti-Si multilayer film remarkably improved corrosion resistance andwear resistance of magnesium alloy. Among them, Ta(N)/Ti-Si12-layer film fabricated at-300V pulsed bias had the best wear resistance, while Ta/Ti-Si12-layer film fabricated at-100V pulsed bias took second place, Ta/Ti-Si4-layer film fabricated at-100V pulsed bias had theworst corrosion resistance. It could be concluded that film with more layers relatively had bettercorrosion resistance in the same deposition time and number of film layer. Ta(N)/Ti-Si12-layerfilm fabricated at-300V pulsed bias had the best wear resistance, while Ta/Ti-Si4-layer filmfollowed, and while Ta/Ti-Si12-layer film the worst wear resistance. It could be concluded thatmetal nitrides film of outermost layer had better wear resistance than metal film of outermostlayer in the same deposition time and number of film layer, and that more film layer is notconducive to improve wear resistance in the same deposition time.