Based On The Batch Type ALD System Control Platform

Atomic Layer Deposition, the latest Deposition Technology in the field of nanometer semiconductor, is widely applied to film products in the manufacture of dielectric material for its advantages like controllability of layer deposition thickness, fine homogeneousness, step coverage rate, and conformity of film graphics, etc. But the ALD technology at present is at the experimental research phase, and both its low efficiency in layer deposition and the lagging configuration of the device control system of the semiconductor technology are an obstruct for the wildly application of ALD technology. To make ALD technology controlling from step by step to automation, make film graphics deposition from experimental research phase to batch production phase, increase of efficiency about source precursor’s chemical reaction, ALD film graphics deposition with batch would be the trend of the nanometer semiconductor.For ALD film graphics technology industrialization demand, this thesis adopts PLC automatic control system as the equipment signal acquisition controlling system, through designing the batch-type ALD control solution, and build a pulse/consistent ALD control system. Overall, this thesis arranges from design of the surveillance progress includes functional modules like automatic control, manual control, technology configuration, alarm signal processing routine, air pressure detecting in the cavity, the whole set configuration, etc. The slave computer control system includes acquisition of the mass ALD technology device digital signal (the start stop mode of the valves of all circuits in the device, mass flow rate and MFC flow rate, source temperature of the cavity and precursor, pressure in the cavity, cavity kinetics, etc.), design of the automatic control progress of the digital signal, design of the technology process, design of the frequency of the technology loop cycle. As the interface connected with PLC and technology platform, the main control circuit applied strong function and weak function of electric drive. Both of host and slave computer will realize the automatic control of the whole set system of the mass ALD technology device through data transmission by Ethernet TCP/IP.Compared with the traditional experimental control system, the upgraded mass ALD automatic control system will be a substitute for the complex single-step manual control system, and will enormously increase the efficiency of the device and technology film production with its simplified operating process. On the other hand, the alarm mechanic of the mass ALD automatic control system will carry out real-time monitoring of the operation of all functional parts in the device, and also produce Excel file for the staff in operation as an experimental reference to effectively reduce false operating by the staffs and increase the precision of the standard of technology deposition. The design of ALD technology with mass, could finish400substrate atomic layer growth of thin film deposition one time, the temperature control accuracy could be as little as0.1℃, the evenness of deposition film uniformity could higher than99%. Be keeping uniformity, step coverage and film graphical shape retention of film of the deposited film, the high throughput of the control system could greatly improve the output rate of the film products, could be satisfied to the semiconductor technology film industry production demand, and laid the applied platform for the promotion of industrial grade ALD platform.