| With the advancement of integrated circuit semiconductor technology,there is a need for integrated chip transistors to have smaller feature sizes,more transistors,and more wiring layers while maintaining high production quality and processing ability.Thin film deposition technology is used to form circuits on cut silicon wafers in integrated circuit manufacturing,and Atomic Layer Deposition(ALD)is a new chemical deposition technology that offers significant advantages in terms of film quality and efficiency.Temperature has a major impact on ALD,so it is crucial to analyze and study the influence of its parameters on temperature distribution uniformity.This dissertation focuses on the heating chamber of ALD equipment and aims to optimize the control algorithm through physical model optimization and mathematical model analysis.The research includes steady-state thermodynamic fluid dynamics simulation in the reaction stage,system heating model control algorithm transfer function model construction simulation,and the construction of an ALD temperature control system.Firstly,the heat transfer and fluid characteristics during the chemical reaction process of the ALD device are analyzed using physical models.The number of intake pipes,intake air flow,intake pipe diameter,and the distance between the base plate and the resistance wire in the heating plate are determined using Ansys software.The changes in temperature uniformity due to various factors are studied,and a physical model parameter optimization strategy is proposed based on the analysis of the results.Next,the mathematical model of the temperature rise curve is obtained,and a fuzzy PID algorithm control system based on Smith prediction is designed using MATLAB software.The system is aimed at improving the accuracy of temperature control and the rapidity of temperature adjustment,and simulation experiments are conducted to compare the results of PID control and fuzzy PID control.The algorithm designed shows good dynamic balance,optimal control effect,and obvious optimization effect on heating plate temperature control.Finally,an ALD temperature control system based on PLC and configuration touch screen is developed,and the fuzzy PID algorithm is used for accurate temperature control.Experimental verification of the algorithm is conducted,and the temperature control optimization of the ALD system based on the fuzzy PID algorithm is realized,providing ideas and references for the development of ALD.This article is about Atomic Layer Deposition(ALD)technology.It focuses on how to control temperature in the heating chamber of ALD equipment,and analyzes and optimizes the ALD temperature control system through physical and mathematical models.The Fluent module in Ansys software is used to analyze the temperature uniformity,and an orthogonal experimental design is used to propose a physical model parameter optimization strategy.For temperature control,a control system based on the Smith predictive fuzzy PID algorithm is designed to address the large inertia and pure lag characteristics,and its superiority is verified through simulation experiments.Finally,an ALD temperature control system based on PLC and configuration touch screen is developed,which realizes the temperature control optimization of the ALD system based on the fuzzy PID algorithm. |
