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Research On Electrochemical Micromachining Of Micro-dimple Arrays With A Dry-film Photoresist Mask

Posted on:2016-10-15Degree:MasterType:Thesis
Country:ChinaCandidate:W W CaiFull Text:PDF
GTID:2271330479476330Subject:Mechanical Manufacturing and Automation
Abstract/Summary:PDF Full Text Request
With a certain surface texture on the surface has obvious effect on the friction characteristics,for example,micro-dimple arrays are fabricated on piston cylinder liner surface in order to storage oil and reduce friction. There are many ways to fabricate micro-dimple array, since through-mask electrochemical machining has high machining efficiency,tool electrode lossless,high surface quality and no residual deformation that it has unique advantages in machining micro-dimple array. In this paper,dry-film photoresist mask is made and micro-dimple arrays are fabricated by through-mask electrochemical machining. And the following works have been done:(1)The research on making the dry-film photoresist mask was carried out. A new method of the dry-film lithography process was proposed,and the parameters were investigated and optimized which made a good foundation for the subsequent experiments.(2)The experimental system was designed,including machine body, the electrolyte system, power supply,fixture,etc. The type of liquid way was chosen for the experiment. And the fixture design was optimized to ensure the mask tightly attached on the workpiece.(3)The experimental research on machining micro-dimple arrays by TMEMM was carried out,the influence of process parameters including initial machining gap,the electrolyte pressure, diameter of the dry-film mask aperture,the machining time and the machining voltage were investigated. The experiment on fabricating the micro-dimple arrays on the outside surface of cylinder by TMEMM was carried out. And with the corresponding fixture design and the optimized parameters, the micro-dimple array was well prepared on the outside surface of cylinder successfully. The experiment on fabricating square-shaped by TMEMM was carried out. And with the optimized parameters,the shape of the "people" was created on the workpiece.
Keywords/Search Tags:Dry-film photoresist, Exposure, Development, Through-mask electrochemical micromachining, micro-dimples array
PDF Full Text Request
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