Preparation And Study Of Silicon Thin Films Deposited By Chemical Vapor Deposition

The rapid development of industry and agriculture have bring social and economic booming, at the same time, also caused serious pollution to the environment.People’s daily life and health have been affected by the deteriorating environment. To maintain people’s normal lifee and keep them healthy, Environmental monitoring and management is particularly important. Sampling inspection is an important part of environment detect.Traditional atmosphere sampling tools use metal containers, when collect low concentration acidic gas samples, due to the acid gas corrosion and adsorption on the metal, causing trace gas detection data appear large deviation, impact test results. It is necessary to research a kind of surface treatment technology to further improve the metal surface. Improve the corrosion resistance and lower adsorption on the surface of the metal, reduce the erroe caused by the sampling the sampling tool structure on the atmospheric composition tesr to improve data accuracy and validity.In this topic chemical vapor deposition technique was used to prepare silicon thin film,whose main composition is silicon.It has good thermal stability resistance and resistance to adsorption.Compared with ordinary atmospheric sampling tools,system, covered by the membrane sampling tools mainly has the following advantages: Reduce the lively atmosphere corrosion, decrease the physical or chemical adsorption phenomenon; To collect samples of atmosphere last longer recovery is better; Passivation layer of long service life; At the same time, using the technology can also be used for different materials such as glass, ceramic substrate coating.This thsis mainly includes the following two contents:1,silane as raw materials,with stainless steel plate as the substrate,using chemical vapor deposition technology deposit to get a smooth and dense layer of silicon thin film. By regulating silane concentration, deposition temperature and deposition time conditions to improve the physical and chemical properties of silicon thin film.And the EDS, electrochemical analysis,energy spectrum analysis,resistance to acid corrosion, surtace contact angle analysis and SEM analysis have been done to represent the silane film’s performance. Results show that when the silane concentration of1.0×104Pa,deposition temperature of 390℃ for 8h deposition time.Chemical vapor deposition of silicon thin film is provided with good physical properties and chemical stability. The thinfilm surtance is smooth and dense with long-term acid corrosion proof performance.2. With silence as raw materials,with glass as substrate,using chemical vapor deposition technology deposit to get a smooth and dense layer of silicon thin film.And the Raman spectra analysis, adhesion of over plate analysis, X-ray diffraction analysis, uv optical absorption analysis have been done to represent the silane film’s performance,.The results show that the the component of silane thin film formed by chemical vapor deposition technology is Amorphous Silicon. The longer reaction time is, the thicker silicon thin will be. It has obvious effects on the glass properties, such as reducing reflaction.