Performance Investigation Of Texture Matching With Anti-Reflection Film Of Physical Polycrystalline Silicon Solar Cells

The technology and efficiency of solar cells have improved much after years of development. Polycrystalline silicon solar cells have been widely used in production with the advantage of low-cost and simple process. The PCE(power conversion efficiency)has reached 18% right now. In this paper, we study the preparation of texture and anti-reflection film prepared by Plasma Enhanced Chemical Vapor Deposition(PECVD), and the matching of texture with anti-reflection films.After acid texturing in different ratios of acid solution and etching time, we find the matching process of texturing with SiNx films prepared by PECVD. We measure the reflection efficiency of physical and chemical polycrystalline silicon wafers after texture and anti-reflection film are prepared,then we fit the reflection efficiency line of which the ratio of HF and HNO3 is 1:4.5,4.75,5,5.25,5.5 and the conveyor speed is 1.1m/min,1.2m/min,1.3m/min,1.4m/min respectively. The result shows that the best matching conditions of physical polycrystalline silicon wafer are HF:HNO3=1:4.75 and conveyor speed is 1.4m/min, while that of chemical polycrystalline silicon wafers are HF:HNO3=1:4.5 and conveyor speed is 1.4m/min.