Deposition Of TiAlN Hard Film By Magnetron Sputte Ring And Related Physical Properties

The twin targets received extensive attention of people because it can overcome a series problems of the Ti-Al alloy target that high cost, be difficult to control the process of preparation of coating composition and the porosity in the alloy structure defects caused by glow discharge such as instability. But at present, a lot of TiAIN ternary composite membrane preparation by twin Al targets or twin Ti targets, the target material installation to make the target material in vacuum coating chamber is at least three or more, the increase of the number of targets complicate the structure of coating equipment and it is not conducive to save costs, based on this kind of situation, this paper creatively adopts twin Ti-Al targets which are two kinds of different physical property, to prepare TiAlN film and explore the corresponding preparation technology is extremely important.In this paper, the TiAIN film have been doposited by magnetron sputtering technology with twin targets on low carbon steel Q235substrate, studied the influence of negative bias amplitude, duty cycle, the working pressure and target current to the TiAIN film surface morphology, film thickness, hardness, corrosion resistance, and characterized the surface morphology, film thickness, hardness and corrosion resistance which have been investigated by the atomic force microscope (AFM), level meter, nano indentation apparatus and electrochemical corrosion platform,at the same time, considering the important effect of the negative bias in the magnetron sputtering coating of charged particles in plasma.Because the important role of negative bias amplitude in the process of magnetron sputtering to the charged particles in the plasma, studied the effection of bias voltage amplititude to the membrane material composition which was tested by theX-ray photoelectron spectrometer (XPS).Research results show that the higher target current and lower working pressure, select the appropriate negative bias, amplitude and duty ratio can effectively reduce the film surface roughness, improve particle size uniformity;The film deposition rate is influenced by target current biggest; Membrane layer of main ingredients for Ti, Al and N, by adjusting the negative bias can effectively adjust the Al/Ti ratio in the film.By XPS fitting result shows that appropriate increase the size of negative bias amplitude increases the TiAlN film content.Through the nano indentation tester and electrochemical corrosion platform for film hardness and corrosion resistance testing and combining TiAIN film surface morphology, film thickness analysis shows that the smoothness and compactness of film surface and the homogeneity of particle size have greater influence to the hardness of the film, the highest hardness is15.17GPa when the film roughness is2.75nm; Film corrosion resistance ability are greatly influenced by surface roughness of film and film thickness, the smaller the roughness, the greater the value of film thickness, the stronger the corrosion resistance of film.