Simulation And Application Of Monocrystalline Silicon Texturing Techniques In The Tdg Company

Photovoltaic power is an important part of solar energy utilization. It is a kind of clean and inexhaustible renewable green new energy. High efficiency and low cost are two everlasting pursuits for photovoltaic industry. At present, for efficient monocrystalline Si cells, the surface reflectivity is one of the important factors to determine the solar photoelectric conversion efficiency. The texture on solar cell surface can effectively reduce solar cell surface reflectivity. Currently, surface texturization of monocrystalline silicon for solar cells has been a mature technique, and chemical etching is the most often used kit.In the production process of single crystal silicon solar cells, a pyramid type suede structure on the single crystal silicon wafer is formed by anisotropic corrosion along the [100 ] and [ 111 ] diretions of single crystal silicon in the alkaline solution.This structure can enhance the efficiency of the solar cell because it’s multireflection results in the increase of the absorptivity of incidence light.In this thesis, a three-dimension dynamic simulating system for silicon anisotropic etching process has been built with the use of OpenGL programme under VC developing environment. It demonstrates the dynamic process of silicon etching and shows the etching results for different masks of silicon bulk. With the guidance of the simulated model, few attempts have been made to optimize the convex compensation method under different experiment conditions. The simulation result agrees with the experimental data very well.The effect of temperature, corrosion time, solution composition, and surface physical damages of Si wafer was studied in the NaOH/isopropyl alcohol(IPA) etching solution. Well-textured surface of Si wafer was obtained in 1.5wt% NaOH and 6vol% IPA aqueous solution at 80℃ with 18 min. The textured surface exhibited better morphology while adding 0.25wt% Na2SiO3 in the solution.