Structure Design Of Magnetron Sputtering Machines And Investigation Of The Uniformity Of CIGS Film

The Copper Indium Gallium Selenium (CuIn1-xGaxSe2 solar cells, short for CIGS)thin film solar cell is a new kind of clean solar, which is regarded as one of most promising solar cells in this country due to its low cost, stable performance, high radiation resistance, high conversion efficiency and wide spectral response range. Now the best CIGS thin film solar cell has reached a conversion efficiency of 20.3%, which was created by Germany Center for solar energy and hydrogen research (ZSW) laboratory in 2010. While its industrialization progress soon, the small piece of CIGS thin film solar cell efficiency was 17.8%, which was prepared by Solar Frontier companies of Japan in 2012, that year, the MiaSole company of the United States and Wurth Solar company of Germany gain the similar result in the developing commercial CIGS thin film solar modules.It is a key to manufacture CIGS thin film for the industrialization of CIGS thin film solar cell, the core layer of CIGS thin film solar cell is CIGS thin film, therefore, the structure and properties of homogeneity of CIGS thin film is a key to prepare large size thin film solar cell modules, which affect the overall performance of Copper CIGS thin film solar cells directly. Now, the technology of large area CIGS thin film formation mainly is selenization after sputtering, however, the process is complex, high demand on equipment, and require use H2Se.In this paper, we designed a vacuum magnetron sputtering equipment by Auto CAD software, which including vacuum chamber design, target design, design of heating and cooling, transmission and air power design, selection of vacuum equipment, selection of monitoring and control equipment, operation panel design. This equipment is access to prepare the 200x200mm CIGS thin film by one step sputtering, the process is simplified, which reduce costs, and avoid the use of H2Se.In this experiment, the XRF analysis results that by using partition-selection revealed CIGS thin film(200x200mm) were prepared by magnetron sputtering equipment that our own designed, The CIGS thin film sample with high degree of crystallization and the Crystal were triangular, the size were about 0.3～0.6μm, moreover, the thickness of the CIGS thin films were uniformity, the value was approximately 0.8μm. The elements composition of the CIGS thin film was closer to the ideal stoichiometric, and the distribution was uniformly. It also showed that the CIGS thin film with high uniformity by the photoelectric property test. Consequently, the structures and properties of the CIGS thin films prepared by this equipment were uniformity.