| Atomic layer deposition technology, the English referred ALD, Its as-deposited film having excellent uniformity and strength combined with strong features, making it favored by experts in the field of microelectronics. By comparing the film uniformity it was found that the reaction temperature of the vacuum chamber has an important impact on the ALD thin film deposition, which requires a higher vacuum chamber temperature control accuracy.Also the temperature of vacuum chamber is a more complex control object, it has characteristics with a long time delay, large inertia, nonlinear and time-varying.With the ALD film growth rate processing needs and characteristics of the vacuum chamber, designing a small overshoot, high steady-state accuracy, fast dynamic response of temperature fuzzy control system.For the entire process of atomic layer deposition, this paper has completed the temperature fuzzy control system design, including hardware selection system, electrical system design and software design. The hardware Dimensioning contains embedded computer, NI data acquisition card, MFC, ozone generator model selection;and the system software design, including software logic, fuzzy control temperature, flow meter, ozone generators, data storage, communication design, and the use of data acquisition card cDAQ data exchange between PC and the next bit machines.In Lab VIEW development environment,the system design of ALD temperature control system of fuzzy control program has achieving the necessary of requirements to the process, and having a great extent to improve the efficiency of the atomic layer deposition, and the design of the system stability, the human-computer interaction interface and operability.The experimental results demonstrates the validity of system operation,and the temperature steady precision is 0.5, and shows that the fuzzy PID control mode in the film uniformity is better and it will be a very important guiding significance in the ALD effect of thin film deposition... |
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