| Plasma enhanced chemical vapor deposition(PECVD) is widely used in semiconductor manufacturing and thin-film material preparation. The characteristic of PECVD reactor is the complex system, which includes heat transfer, fluid dynamic, Electromagnetic field, plasma discharge and chemical reactions. As the development of the information industry, the research process of PECVD equipment has been shifted from the traditional experience of trial and error to the combination of simulation and experiment. So far, the simulation software on the market has accurate calculation ability. But it can’t support the design of PECVD equipment. This thesis focus on build a software platform based on the simulation software on the market, combined CAD and CAE software to design the PECVD equipment.For the characteristics of PECVD reactor, the design of agent-based system is analyzed, the concept of the agent-base modeling and simulation is elaborated, and the software system of PECVD reactor simulation is built.Based on the software platform, the scheme of the overall function of the system is analyzed. It defines the logical relationship of system operation and the function of modules. The technical scheme of the software system is elaborated, it analyses the function and importance of the XML data exchange technology. The work flow and data flow of the system is studied.Based on the simulation software system, a real engineering problem is solved. For the distance of showerhead and wafer surface and the height of the outlet, the quadratic regression factorial experiment is established, and the result is analyzed and verified. At the same time, the reliability of the software system is verified. |