Study On The Effect Of Filtration Electrode Structure On The Performance Of Thin Films Prepared By EFMs

With the development of thin film science and the progress of film industry,thin film preparation technology has also been rapid development.Magnetron sputtering coating technology has been widely used in surface micromachining,surface modification,optical film,semiconductor thin film,microelectronics and optoelectronic technology because of its many advantages.Its advantages are: the deposition rate is fast,the film and the substrate adhesion is good,can easily produce high melting point material film,film forming area and so on.But it also has some shortcomings we can not ignore,such as the preparation of the surface rough,thin film particles,poor uniformity,the structure is not dense] and so on.In order to overcome the above shortcomings of magnetron sputtering technology,we have improved the CS-300 magnetron sputtering coating machine in our laboratory.And referred to as energy filtration magnetron sputtering(EFMS),and has achieved good Technical effect.In this paper,TiO2,ITO and ZnO thin films were prepared by magnetron sputtering(DMS)and energy filtration magnetron sputtering(EFMS).The effects of the size of the filter electrode on the structure and properties of the films were studied by energy filtration magnetron sputtering(EFMS).The structure,optical properties and uniformity of films prepared by conventional magnetron sputtering(DMS)and energy filtration magnetron sputtering(EFMS)were studied.The research work is divided into four parts,the main research contents and conclusions are as follows:TiO2 thin films were prepared by DMS and energy filtering magnetron sputtering(EFMS).We characterized to the thin film structure,surface morphology and optical properties(light transmittance,refractive index,extinction coefficient)and electrical performance(square resistance and resistivity)by XRD,SEM and spectrophotometer,elliptic polarization spectrometer and four point probe resistance.The results show that the crystallization quality of the 8-mesh sample film is the best,the surface particle size is small and the roughness is low.The optical propertiesshow that with the increase of the mesh number for the refractive index and the extinction coefficient decreases.The optical band gap is not affected by the mesh.ITO films were prepared by DMS(0 mesh)and energy filtering magnetron sputtering(EFMS)with different mesh filter electrodes respectively.The results showed that the crystallization quality of the 8-mesh sample film is the best,8 mesh and 30 mesh film surface particles smaller,the gap between the particles is not obvious;30 mesh sample transmittance of the highest,8 mesh and 30 mesh refractive index and extinction coefficient is higher.ZnO thin films were prepared by DMS(0 mesh)and energy filtering magnetron sputtering(EFMS)with different mesh filter electrodes.The results show that the grain size is the best at 30 mesh,the particles of the 30 mesh and 8 mesh are small,and no obvious clusters are observed.The transmittance of the 8-sample film is the highest,and the optical bandgap of the ZnO thin film is not affected by the filter electrodeThe TiO2 films were grown by both of DMS and energy filtering magnetron sputtering(EFMS)on glass substrates,respectively.The properties of the films were characterized by SEM,X-ray diffraction,and ellipsometric spectroscopy.The results show that the uniformity of crystallinity and optical properties of TiO2 films prepared by EFMS are improved in a large area.