Design Of The Key Parts And Simulation Of The Equipment Of HFCVD

Because of the unique mechanical, thermal, optical and electrical properties of diamond film,it has been applied in various fields and have a very broad application prospects. CVD diamond coated tools and PCD(polycrystalline diamond) tools has greatly improved in machining precision and life than conventional cutting tools.As it appears first,and the technology research is most mature, HFCVD(Hot Filament Chemical Vapor Deposition)become the preferred method for depositing diamond films.This paper introduces the development history and application of diamond films, introduced the diamond film deposition mechanism, proposed the unitary structure of equipment which use the way of HFCVD to grow diamond film. Then designd the overall structural of HFCVD equipment,and later designd the critical parts of the structural,and the detailed calculation, get the key parts of the relevant parameters, and simulated electrical, thermal, structural of the critical parts of the structural on ANSYS Workbench to verify the design of reasonable and safety. Finally, simulated temperature field distribution of the reaction chamber of HFCVD diamond film equipment based on the FLUENT,so obtained reaction chamber temperature field, which to assist the design of the reaction chamber cooling system.Then, calculated the parameters of the cooling water flow of reaction chamber in use of finite element theory, heat transfer and fluid mechanics knowledg,then obtained the relation of the flow rate of cooling water and the temperature of outflow, which is used for the experiment later.