| The Mo-10 Nb alloy targets were prepared via hot pressing sintering process.The prepared Mo-10 Nb targets were used for DC magnetron sputtering coating.The properties and microstructure of the sputtered films were examined and characterized.The influence of the preparation process of Mo-10 Nb target on the sputtered film was analyzed.Through the improvement of the hot-pressing sintering process,to explore the optimum hot-pressing process parameters,to prepare Mo-10 Nb alloy target with high purity,high density and grain uniformity and the effect of the target on magnetron sputtering films.The effects of sintering process,Nb powder content on the density and microstructure of Mo-10 Nb alloy target were investigated.The mechanism of densification of Mo-10 Nb alloy by hot pressing was investigated.In addition,The effect of temperature of Mo-10 Nb by hot-pressing alloy target on the conductivity and surface morphology of magnetron sputtering films.The preferential orientation and crystallization of the sputtered film were investigated by X-ray dif-fraction spectroscopy.The conductivity of the films were measured by four-probe instrument for measuring sheet resistance.The surface roughness of the film was analyzed by atomic force microscopy.The thickness of Mo-10 Nb alloy target was analyzed by scanning electron microscopy.And then determine the relationship between the temperature of Mo-10 Nb alloy target by hot pressing and micro-morphology and properties of sputtered film.The results show that the Mo-10 Nb alloy target is more easily obtained by the hot-pressing sintering process than the non-pressure sintering process.The distribution of Nb elements is faster due to the faster diffusion rate of atoms in hot-pressing sintering,and the densification process of Mo-10 Nb alloy is consistent with the McClelland hot pressing equation,which indicates that the hot pressing sintering temperature and pressure are the key factors of densification of Mo-10 Nb alloy.Simultaneously,the addition of Nb powder in the mass fraction of 10% is beneficial to the densification and grain refinement of the target.In addition,The Mo-10 Nb alloy target was prepared by hot pressing process with the maximum temperature of 1820 ?,holding time was 2h and maximum pressure was 15 MPa.At this time,the crystallization of the sputtering film was good and the orientation was(110).The surface roughness of the film was 87 nm,the surface size of particles uniform,good film conductivity,side resistance was merely 0.1 ?(14)?. |
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