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Preparation Of VO2 Thin Films By Magnetron Sputtering And Study On Their Structure And Properties

Posted on:2020-07-06Degree:MasterType:Thesis
Country:ChinaCandidate:K P LiFull Text:PDF
GTID:2381330572472738Subject:Materials Science and Engineering
Abstract/Summary:PDF Full Text Request
As one of the smart energy-saving materials,VO2 has excellent dimming performance and can intelligently control the indoor temperature according to the changes in the environment.However,in order to apply VO2 in real life,it is necessary to decrease the phase transition temperature to near room temperature and to increase the average visible light transmittance of the film.In this background,when ceramic V2O5 was used as the target,the effects of deposition temperature,film thickness,deposition atmosphere and annealing on film structure,phase transition temperature and average visible light transmittance were studied.When metal V was used as the target,the effect of sputtering power,atmospheric flow and annealing on film structure,phase transition temperature and average visible light transmission were studied.The results obtained are showed below:?1?When a V2O5 target is used,400? is the best deposition temperature for obtaining VO2?M?film.Films prepared at different deposition temperatures and H/O-doped films are annealed at 500? to obtain?100?oriented VO2?M?with good crystallinity;when using a V target,a single-phase VO2?M?film at a sputtering power of300 Wwith O2 flow around 3 sccm can be obtained after annealing at 500?.?2?The phase transition temperature of 60 nm VO2?M?film deposited at 400? decreased first and then increased with the increase of annealing temperature.For films prepared from different deposition temperatures and annealed at 500?,the phase transition temperature of the film with the same film thickness tends to gradually decrease with increasing deposition temperature;H doping can reduce the phase transition temperature of the film.The phase transition temperature of the film can be controlled according to the H2 flow rate introduced during the preparation,the annealing temperature and the annealing time;the presence of the low-valence vanadium oxide decrease the phase transition temperature of the VO2?M?film.?3?The average visible light transmittance of 60 nm VO2?M?film is the highest,about 50%;The presence of high-and low-valence vanadium oxide can increase the average visible light transmittance of the VO2?M?film;Heat treatment is beneficial to improve the average visible light transmittance of the film.
Keywords/Search Tags:Magnetron sputtering, V2O5 and V target, VO2 film, Phase transition temperature, Average visible light transmittance
PDF Full Text Request
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