The Study Of An Ar-electronegative Gas Discharge In Magnetron Sputtering Device

Magnetron sputtering is a most widely applied sputtering deposition technology.Ar and electronegativity gas discharge play a significantly important role in producing thin film by magnetron sputtering.The performance of thin film will be greatly affected by the distribution of particles in plasma and by the electron energy.Based on experiments,this article studies changes of substrate floating voltage and saturation current values by different sputtering power supplies,various powers and Ar/O₂ mixing ratios,which will help to figure out the properties of plasma in the discharge of gas mixture.By setting up the model of two-dimension magnetron sputtering device,this article studis discharge respectively from the gas mixture of Ar/O₂ and Ar/O₂/Cl₂ simulate to obtain the distribution diagram of major particles and electron temperature,discuss the influences of the radius of gas reactor chamber,mixture ratio and intensity of pressure on spatial distribution of major particles.The research contents of this article are as follows:The experiment adopted DC and pulse DC driving power to respectively sputter Zn target under different powers.Then change the mixture ratio of Ar/O₂ and measure the changes of substrate floating voltage and saturation current value by DC power to study the impact of power driving method and mixture gas flow ratio on the behaviors of plasma.The experiment results show that the change of the mixture ratio exerts no influences on the ion density surrounding the substrate.As the flow of oxygen increases,the electron energy near the substrate will drop.Under the conditions of DC driving power sputtering,both the suspend floating voltage and saturation current of substrate are larger than that of the pulse.As the power rises,suspend floating voltage remains the same while saturation current will be increased.Set up the model of two-dimension magnetron sputtering device to simulate the influences of mixing ratio and intensity of pressure on the discharge of Ar/O₂ mixture gas.The results have demonstrated that Ar2+ is major charged particles among the plasmas of mixture gas,and O₂+ ais the main oxygen ion.The mixture ratio seldom changes the density for electron and metastable state particle of Ar.As the proportion of Ar increases,the maximum density of Ar2+ in the plasma will rise accordingly while the maximum density of O and O₂+ will decrease.However,the variations of mixture ratio will not change the value of density for Ar2+and O₂+ close to the substrate.With an increase in the Ar proportions,the electron temperature will be declined.And The main charged species density increases monotonically with increasing pressure from 5 mTorr to 10 mTorr,while the electron temperature and the density of Ar metastable state particle will be dropped as the intensity of pressure rises.Establish a new model of two-dimension magnetron sputtering device to simulate the features of plasma discharged by the mixture gas of Ar/O₂/Cl₂.The major particle include Ar**,Ar*,e,Ar2+,Cl,Cl₂+,O?3P?and O₂+.As the reactor chamber is expanded,the design of magnetic field seems extremely important.With asymmetric magnetic pole,you can raise the uniformity of the plasma density distribution on the substrate.When the mixture ratio of Ar/O₂/Cl₂ is changed from 9:0.2:1 to 9:1:0.2,major particles are nearly unchanged.However,the concentrations of Cl₂+ ion and Cl atom are significantly dropped while the concentrations of electron,Ar intermediates and O atom are slightly raised.The distribution of major particles is significantly affected by the intensity of pressure.The electron density in case of 3 mTorr is smaller and less uniform than that of 6 mTorr.The density of CI and O has achieved relatively slight increases.