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Photoelectric Properties Of Vanadium Dioxide Films Under Different Film Layers

Posted on:2018-10-27Degree:MasterType:Thesis
Country:ChinaCandidate:K YangFull Text:PDF
GTID:2351330536956142Subject:Thin film physics and technology
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In modern city,in order to improve daylighting factor and aesthetics,glass curtain wall area constitutes increasing gradually for buildings.To avoid the poor energy-saving and serious energy consumption problem of ordinary glass,energy-saving coating glass is used,of which the most common are low-e coating glass.However,optical spectrum of low-e coating glass is fixed,and the energy-saving effect is limited.Due to the infrared transmittance abrupt change in phase transition process,and the phase transition temperature is closing to room temperature,the VO2 smart window has become one of hot research topics in recent years.In this thesis,to lower phase transition temperature,improve transmittance in visible range and solar infrared modulation ratio of VO2 thin films,the influence of buffer layer,antireflective layer and sandwich structure on VO2 photoelectric performance are researched.VO2 thin films were fabricated by DC reactive magnetron sputtering on different buffer layers of 100 nm Al2O3 and TiO2,respectively.All buffer layers were prepared by electron beam evaporation at room temperature.The results show that the buffer layers induced the crystallization of VO2 phase,and enhanced photoelectric performance of the VO2 thin films.Meanwhile,the phase transition temperatures of VO2 films are reduced in some degree.The thin film prepared on TiO2 buffer layer exhibits high microstructure and phase transition performance.The photoelectric properties of the VO2 thin films grown on Ti pre-fabricated layers were studied.The results show that Ti pre-fabricated layers change the c-axis length of the VO2 crystals,and the phase transition temperature of VO2 thin films reduced as low as 45°C.Ti pre-fabricated layers oxidized into TiO2 in VO2 thin film deposition process for high temperature,which results in visible light transmittance improving due to interference effect between TiO2 and VO2 layers.High transparent MgF2,Al2O3 and TiO2 thin films were deposited on VO2 thin films as antireflective layers,respectively.Experimental results show that thetransmittance in visible range and solar energy modulation ratio of the VO2 thin films are significantly improved by adding the antireflective layer.Moreover,the performance of the VO2 thin films with double antireflective layer is better than the single antireflective layer of the thin films.Among them,the transmittance waveform of the sample consisted of VO2 / TiO2 / Al2O3 is the most similar to ideal model.Calculation results reveal that the solar energy modulation ability is nearly 10% in full spectra,and nearly 35% in near infrared range,which exceed up to 13% compared to single VO2 thin film.VO2 thin films deposited on the MgF2 bufferlayers with good crystallization.results show that MgF2 films were decomposed and part of Mg2+ and F-doped into VO2 in its growing process at high temperature,which caused phase transition temperature decreasing of the VO2 thin films,blue shifting of absorb edges in the spectra,and enhancement of the visible transmittance.However,the solar energy modulation ability drops significantly in dense energy range from 750 nm to 1250 nm,which lead to decreasing of the solar energy modulation ability in full spectrum and in near infrared spectrum.Sandwich structure of MgF2 / VO2 / MgF2 multilayer films was also investigated,which exhibits better visible transmittance and solar energy modulation ability than that of single VO2 thin film or only MgF2 buffer layer.The maximum transmittance is as high as 55% and the best energy modulation ability in full solar range and near infrared range,which is 7.64% and 27.46%,respectively.
Keywords/Search Tags:VO2 Thin Films, Buffer Layers, Antireflective Layers, Sandwich Structure, Solar Energy Modulation Ability
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