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The Photo-responsive Behavior Of ZnO/graphene Composite Film Prepared By Double Glow Plasma

Posted on:2019-03-24Degree:MasterType:Thesis
Country:ChinaCandidate:X M ZhaoFull Text:PDF
GTID:2371330545470204Subject:Optical Engineering
Abstract/Summary:PDF Full Text Request
The semiconductor film can be widely used in photoelectric field.Single-crystalline(002)-oriented Zinc Oxide(ZnO)can shorten the path of charge transfer and reduce the recombination of charge carriers,greatly enhance the ZnO semiconductor photocurrent response.Owing to its performance,ZnO attracted a lot of attention.However,single ZnO film has low interfacial charge transfer efficiency and a high recombination rate of photo-generated electrons and holes,which limits its application in the field of optoelectronics.The incorporation of semiconductor nanoparticles and graphene is considered to be one of the ways to solve those problems,because graphene enhances the charge transfer and avoid the recombination of photo-generated electrons and holes,which greatly improves the photoelectric properties of composite film.In view of the problem that the preparation method of high quality ZnO film,graphene film with high preparation cost,low repetition rate and other aspects of the shortcomings.The preparation of ZnO nanorods film,graphene film and its composite film with double-glow plasma surface alloying technique is proposed by the first time in this paper.Then,the preparation process is optimized,the composition and microstructure of the films were analyzed by Raman spectroscopy,XPS,XRD,SEM,TEM and AFM.Furethermore,the water contact angle,UV-Visable light spectrum and photoelectric chemical test are used to compare and analyze the UV response behavior of different film.The main contents are as follows:(1)Double-glow plasma surface alloying is used to prepare ZnO nanorods film.The preparation process of ZnO thin film is optimized by adjusting pressure,the ratio of Ar and O2 and preparating time.Subsequently,the structure and UV response of ZnO thin films with the best process were studied.The ZnO films with uniform nanorods structure and good c-orientation can quickly produce and transmit photogenerated electrons.(2)The graphene paper as target,large area graphene film is prepared by double-glow plasma surface alloying.The structure and performance of graphene are analyzed,the response behavior of water contact angle and tribological properties under UV excitation are studied.It is found that the graphene film are stacked by disordered graphene nanosheets.Moreover,the UV excitation lead the change of morphology and structure in graphene which can induce the enhancement of hydrophobicity and the decrease of friction coefficient.(3)The best process of ZnO nanorods film and graphene film are used to prepare ZnO/graphene composite film.The morphology and structure of composite films are investigated,the UV response behavior of ZnO film and ZnO/graphene composite film was studied and compared.The composite films are found to be a good combination with the matrix.In addition,graphene is mostly found in the form of crumple.The introduction of graphene provides a channel for photogenerated electrons and weaken the recombination of charge carriers,which can improve the UV photoelectrical response performance of the composite film.(4)Graphene/ZnO composite films were prepared on Ni foils and then the flexible electrodes were obtained.The UV photocurrent measurements is characterized.The introduction of graphene causes the enhancement of photocurrent in electrode,which is expected to be applied in the field of photoelectric detection...
Keywords/Search Tags:ZnO film, graphene film, ZnO/graphene composite film, UV response, double glow plasma plating technology
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