Study On Technology And Properties Of AlTiN Coating By Magnetron Sputtering Ion Plating

AlTiN coating has high oxidation resistance,thermal hardness,bonding strength,strong wear resistance,matrix,such as a typical carbide tool coating.AlTiN coating has been a hot spot in the scientific research of mechanical processing.In this dissertation,AlTiN coating were deposited by the magnetron ion plating with different compositions on the substrate of carbide tools by orthogonal test.The samples were divided into auto rotation control group and non-auto rotation control revolution group.The effects of target current,bias voltage,and the time of each experimental process parameter on the mechanical properties of the two sample.In order to find out the ability to plate excellent performance coatings,The AlTiN coatings were studied.A comparison experiment was conducted with the revolution and rotation of the experimental parameters in the experimental group,and the target surface current,bias voltage,and time were analyzed.The surface morphology,fracture morphology,and coating composition of the experimental AlTiN coating were reversed and rotated.The influence of the phase structure was analyzed to explore the mechanism behind the coating performance.The analysis of micro hardness and bond strength of the(Al,Ti)N coatings were showed that the micro hardness was as high as 2891 HV and the maximum film-bonding force was74 N for the revolution and rotation groups.For the revolution and non-rotation groups,the highest micro hardness was 2883 HV,and the maximum film-based adhesive force was78.5N.For the revolution and rotation group,the target current becomes larger,and the micro hardness of the coating was first increases and then decreases.As the bias voltage and deposition time increase,the micro hardness of the coating was first decreases and then increases.The film-based adhesive force decreases continuously with increasing target current and deposition time,and increases continuously with the increase of the bias voltage.For the deposition rates of the two(Al,Ti)N coatings: the target current increases,the average deposition rate of the coating increases,the bias voltage and deposition time increase,and the average deposition rate of the coating decreases first and then increases.Analysis of Fracture Morphology,Surface Topography and EDS Spectra of Revolutionary and Rotational(N,Ti)N Coatings: Target Current Increase,Al atomic Percentage in Film,Al/Ti Ratio,(Al+Ti)/N Ratio increase were indicated that the amount and energy of the sputtered particles increase,the active atom diffusion and migration ability to the coating surface is enhanced,the grain refinement and growth rate are accelerated,and the denseness of the coating is improved.When the bias voltage increases,the percentage of Al atoms and the Al/Ti ratio increase first and then decrease,and the energy gained by themetal particles and N particles reaching the surface of the substrate increases.It was advantageous for the reaction to deposit the coating first,and when it increases to a certain extent,The residual stress of the coating increases,the defects increase,and the anti-sputtering effect increases.The XRD results of(Al,Ti)N coatings for the revolution and rotation groups were showed that the layers were mainly AlN and Ti N phases,and the diffraction peaks of the coating phase structure were broadened.With the increase of the target current and bias voltage,the growth of the AlN phase on the(111)surface was enhanced.