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Sputter Deposited Terfenol-D Thin Films And Property Research

Posted on:2018-04-08Degree:MasterType:Thesis
Country:ChinaCandidate:S L YouFull Text:PDF
GTID:2371330566451539Subject:Software engineering
Abstract/Summary:
Terfenol-D magnetostrictive material is one of the key materials for microwave devices,which is widely used in wireless communication,radio frequency communication,satellite communication,data acquisition and other communication fields.Therefore,the research of Terfenol-D magnetostrictive material is of great significance.The magnetron sputtered films were prepared by RF-DC magnetron sputtering on a single crystal Si(100)substrate.The vacuum heat treatment of the amorphous films was carried out.Effects of heat treatment temperature and time on the structure,magnetostriction and related magnetic properties of Terfenol-D thin films.The optimum sputtering parameters and the optimum heat treatment parameters of the prepared Terfenol-D films were obtained,which provided the experimental basis for the preparation of high property Terfenol-D materials.The results show that the composition of the film changes with the increase of working pressure,and the content of Fe atoms in Terfenol-D thin films increases with the increase of working pressure is increased to the highest at 2.0Pa.With the increase of gas pressure,the sputtering rate of the film first increased and then decreased,and the deposition rate was the highest at 1.0Pa.The composition of Terfenol-D film does not change with the increase of sputtering power,but the deposition rate keeps increasing.With the increase of sputtering time,the composition and deposition rate of Terfenol-D film do not change.The films prepared by vacuum heat treatment below 475℃were amorphous.After annealing at above 475℃,the films of Terfenol-D had RFe2 magnetostrictive Laves phase and R2O3 rare-earth oxides.With the increase of temperature,the precipitation phase of Terfenol-D thin film is dominated by R2O3rare-earthoxides.The R2O3phase reduces the magnetostrictive properties of Terfenol-D films at low magnetic field,and the RFe2 phase improves the magnetostrictive properties of Terfenol-D films at low magnetic field.The RFe2 magnetostrictive Laves phase and the R2O3 rare earth-oxide precipitate inthe Terfenol-D films at 0.5h,1h,2h,3h in vacuumat475℃.The RFe2 magnetostrictive Laves phase is mainly present in the Terfenol-D film during vacuum heat treatment for 2h.The magnetostrictive Laves phase of RFe2 improves the magnetostriction of Terfenol-D thin films at low magnetic field.
Keywords/Search Tags:Terfenol-D thin films, Magnetron sputtering, vacuum heat treatment, magnetostrictive
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