Study On The Technology Of Epitaxially Growing TiCN Thin Films On STO Surface

There is a series of problems of poor adhesion strength,poor hydrophobicity and oleophobicity when magnetron sputtering technology is applied to the film prepared on the surface of aluminum alloy,stainless steel and other materials.In order to improve the adhesion strength of the film,a process that can make the film epitaxially grow is studied.It can change the structure from physical integration into chemical bond binding,thereby improving the adhesion strength and reducing the phenomenon of film aging and peeling.It is of greatly extensive research significance and application value to research the preparation of the self-cleaning film with hydrophobicity and oleophobicity at the same time.In this paper,TiCN films were epitaxially grown on STO?SrTiO₃?substrates by medium frequency reactive magnetron sputtering.This research is aimed at the TiCN films prepared.The magnetron sputtering process parameters and annealing process parameters were studied through the methods of orthogonal test and single-factor test.The microscopic morphology,film growth,micro-region composition and three-dimensional morphology of TiCN thin films were studied by X-ray diffraction,field emission scanning electron microscope,energy dispersive spectrometer and three-dimensional super depth microscope to reflect the condition of epitaxial growth of thin films.In addition,the final process parameters are optimized through the performance test of deposited films.Through orthogonal test and combination test,the sputtering process parameters are optimized when the film presents best hydrophobic and oleophobic effects.Meanwhile,the methane flow gives the greatest influence on hydrophobicity with the range of 10.058.The results show that the TiCN nano-film is successfully prepared on STO surface.The film structure under different methane flows is investigated.The?111?preferential orientation growth of TiCN films increases with the rise of methane flow,so does the trend of epitaxial growth of the film along the direction of the substrate.The film is uniform and dense with the grain size of 30 to 50 nm.The interdiffusion between the thin film and substrate atoms increases and the thickness of the film is between133.81 and 135.79 nm.The obtained magnetron sputtering process parameters were verified and tested,and the hydrophobic angle of the film was stabilized at 100�.To further improve the hydrophobicity and oleophobicity of the film,the influence of the main bombardment voltage on the properties of the film was investigated.Appropriately increasing the main bombardment voltage can increase the surface roughness of the film so that can increase the hydrophobicity and oleophobicity of the film.Based on the sputtering process study,the single-factor analysis of the main bombardment voltages of 450 V,500 V,550 V and600 V is conducted to research hydrophobicity and oleophobicity of films,and both show the largest contact angles at the main bombardment voltage of 550 V,which is respectively 107.6�and 78.1�On the basis of process exploration,a single-factor annealing test is performed on TiCN films at 250�C,300�C,and 350�C for 60 minutes.The adhesion strength of film/substrate increases with the rise of temperature,and the maximum is 31.2 N annealed at 350�C.The annealing treatment can eliminate the columnar crystals in the film and improve the quality of the film.The hydrophobicity and oleophobicity of the film increase gradually with the annealing temperature rising,both of the water contact angle and oil contact angle reaches maximum at 350�C,respectively,119.3�and90.2�.The TiCN film technology was applied to aluminum alloy,stainless steel and silicon steel materials,on which the film exhibits better hydrophobicity and oleophobicity,and the problem of film desquamation gets well settled.