Carbon Nanotubes Assisted Nanostructure Fabrication

Nanofabrication technology is a tool for human beings to understand the micro world,but the capacity is often limited by equipment.As a new type of nano material,carbon nanotubes have many unique physical properties.In this thesis,the carbon nanotubes and nanofabrication technology were combined to fabricate the nano structures which break through the existing capacity.Firstly,using the properties of UV absorption,a carbon nanotube mask was fabricated by the super-aligned carbon nanotube films.Using this mask,a photoresist pattern of carbon nanotube film morphology can be achieved in combination with an appropriate exposure process and can be transferred to the substrate by an etching process.We also studied the effect of surface morphology on the hydrophobic,and found that the morphology of carbon nanotube films conformed to the hydrophobic characteristics.We fabricated a hydrophobic surface with carbon nanotube film morphology by using the carbon nanotube mask.Secondly,using the quasi-one-dimensional physical properties of carbon nanotubes,a sub-10 nm gap was obtained.The carbon nanotubes were suspended by transfer and electron beam lithography and were used as a mask in electron beam evaporation process.Since the radial size of the carbon nanotubes is small,we obtained a sub-10 nm gap on the substrate.At the same time,we adjusted the parameters and found that the results can be repeated within a certain range,which proves that this is a stable method of obtaining sub-10 nm gap.Finally,the electrical characteristics of carbon nanotubes were used as the conductive layer,which was applied to the electron beam lithography on the insulating substrate.In addition,we obtained the grating structure with the "Z" shape by shadow evaporation.Different colors can be presented by adjusting the design,and the height of grating affects its color performance under the polarization.The structure was fabricated on the quartz substrate by using carbon nanotubes as the conductive layer,which expands its optical application.