Preparation And Properties Of Al₂O₃/Ag/AZO/Al₂O₃ And Al₂O₃/AZO/Al₂O₃ Low-emissivity Films

Low-E glass as a representative of energy-saving insulation materials has been extensively studied.Low-E glass has a high visible area permeability and high reflectivity of the infrared area,can effectively block the exchange of indoor and outdoor heat radiation,plays a role in energy conservation,which has been widely studied at home and abroad.Low-E glass is important for energy-efficient buildings.But the Ag-based low-E glass and TCO-based low-E glass have their own shortcomings,for example,Ag film is easy to be oxidized,easily damaged and Ag film itself shows a lower regional transmittance,which leads to the low transmittance of Ag-based low-emissivity glass and the further processing and service life are limited;TCO film through the doping to achieve high-performance conductive and high infrared reflectivity,in order to achieve the desired performance TCO film thickness is thick,which greatly increased the difficulty of thin film preparation.In order to solve these problems,this paper systematically studies the Al₂O₃/Ag/AZO/Al₂O₃ low-E film system and the Al₂O₃/AZO/Al₂O₃ low-E film system.The conclusions of the paper are as follows:?1?The simulation of Al₂O₃/Ag/AZO/Al₂O₃ low-E film by TFCalc optical fitting software shows that the average transmittance of the best visible region is 74.76%.The effect of different thickness Ag films,Al₂O₃ buffer layers and Al₂O₃ film protective layers on the structure and photoelectric properties of Ag / AZO functional layers were studied.When Al₂O₃ film buffer layer thickness is 20 nm,AZO film thickness is208 nm,Ag film thickness is 10 nm,Al₂O₃ film protective layer is 30 nm,it can obtain good performance Al₂O₃ / Ag / AZO / Al₂O₃ low-emission film system.The Al₂O₃ /Ag / AZO / Al₂O₃ low-emission film system has an average transmittance of 70.83%,a maximum transmittance of 81.47%,an average reflectance of the infrared region?4000-400 cm-1?of 83.86% and an emissivity of 0.13.?2?A new type of Al₂O₃/AZO/Al₂O₃ low-E film was designed by TFCalc optical fitting software.The effect of different thickness AZO films,different substrate temperature,Al₂O₃ buffer layers and Al₂O₃ film protective layers on the structure and photoelectric properties of AZO film functional layer was studied by magnetron sputtering technique on ordinary glass slides substrates.When Al₂O₃ film buffer layer thickness is 20 nm,AZO film thickness is 1278 nm,Al₂O₃ film protective layer is30 nm,it can obtain good performance Al₂O₃ /AZO / Al₂O₃ low-emission film system.The Al₂O₃ /AZO / Al₂O₃ low-emission film system has an average transmittance of84.72%,a maximum transmittance of 87.13%,an average reflectance of the infrared region?4000-400 cm-1?of 88.51% and an emissivity of 0.108.The performances of Al₂O₃/ AZO / Al₂O₃ low-emission film system have been significantly improved comparing with Al₂O₃ / Ag / AZO / Al₂O₃ low-emission film system.?4?The Al₂O₃ / Ag / AZO / Al₂O₃ low-emissivity films systems and Al₂O₃ / AZO/ Al₂O₃ low-emissivity films systems have good low radiation performance,in further optimizing the thickness of the film and the preparation process,is expected to obtain practical application.However,due to the problem of coating precision and lack of research on the performance of functional layer,there is still a distance between the average transmittance of visible region and the results of calculation.Some of the reasons lie in the interference colors.A further experimental analysis is needed to be done.