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Study On Highly Transparent Conductive Ag Films And SnO2/Ag/SnO2 Composite Films By Magnetron Sputtering

Posted on:2020-07-27Degree:MasterType:Thesis
Country:ChinaCandidate:C J WangFull Text:PDF
GTID:2381330572972752Subject:Materials Science and Engineering
Abstract/Summary:PDF Full Text Request
The TCO/M/TCO three-layer film based on ultra-thin metal film has good transparent conductivity and it is a research hotspot in the field of optoelectronic materials.Studies have shown that the intermediate metal layer has a significant effect on the transparent conductive properties of the three-layer film.Therefore,a series of Ag films with different thicknesses were prepared at two deposition rates?0.065 nm/s0.75 nm/s?and deposition atmospheres?Ar,Ar+H2 and Ar+N2?.The effects of deposition atmosphere and deposition rate on the surface roughness,crystallinity and transparent conductivity of Ag film were systematically investigated.Then,on the basis of the study of single-layer Ag film,a three-layer film of SnO2/Ag/SnO2 was prepared to investigate the effect of deposition rate and deposition atmosphere of Ag layer on the transparent conductivity of the three-layer film.The main results obtained are showed below:?1?The Ag film prepared at high deposition rate has a large grain size,high crystallinity and small surface roughness.Compared with the Ag film prepared at low deposition rate,the Ag film prepared at a high deposition rate has better electrical conductivity and has better transmittance at lower film thickness,but when the thickness of the Ag film become larger,the Ag film prepared at low deposition rate has higher transmittance.Compared with the Ag film prepared under a pure Ar atmosphere.The Ag film prepared at the Ar+H2 atmosphere has a larger grain size and a rough surface.The surface of Ag film prepared at Ar+N2 atmosphere is smoother and the grain size is fine.Take a comprehensive view of its photoelectric performance,when the Ag film was prepared under Ar+H2 atmosphere,its conductivity did not change significantly,but the light transmission performance decreased significantly.When the Ag film was prepared at Ar+N2 atmosphere,the conductivity decreased slightly,but the light transmission performance was grealyt improved.?2?The effect of deposition rate and atmosphere on the photoelectric properties of SnO2/Ag/SnO2 films is generally consistent with that of single layer Ag films.When the Ag film at low thickness,the SnO2/Ag/SnO2 three-layer film prepared at high deposition rate of Ag layer had better transmission and conductivity.When the Ag film at high thickness,the SnO2/Ag/SnO2 three-layer film prepared at low deposition rate of Ag layer had better transmittance.At high and low deposition rate of Ag layer,when the thickness is 6 and 8 nm respectively,SnO2/Ag/SnO2 three layers film achieve the highest quality factor(3.45×10-2?-1?4.73×10-2?-1).The introduction of N2 in the Ag layer during high-speed deposition is beneficial to improve the photoelectric properties of the SnO2/Ag/SnO2 three-layer film.It has the best photoelectric performance when the thickness of the Ag layer is 8 nm,the figure of merit is4.84×10-2?-1.The introduction of H2 in the Ag layer at low-speed deposition reduces the photoelectric properties of the SnO2/Ag/SnO2 three-layer film,but the introduction of N2 is beneficial to the photoelectric properties of the SnO2/Ag/SnO2 three-layer film.The best photoelectric properties were obtained when the thickness of the Ag layer was10 and 15 nm,respectively,and the quality factors were 2.75×10-2?-1?5.13×10-2?-1,respectively.?3?The SnO2/Ag/SnO2 three-layer film was placed at 85?and 85?,85%humidity environment for two days.It was found that the performance of the film was stable in the dry environment of 85?,and the performance of the film was significantly decreased at 85?,85%humidity environmen.The SnO2/Ag/SnO2three-layer film was annealed,and the photoelectric properties of the film were improved as the annealing temperature increased.Among them,the SnO2/Ag/SnO2three-layer film prepared at low deposition rate and Ar+N2 atmosphere of Ag layer reaches a maximum figure of merit of 7.07×10-2?-1 after annealing at 150?;when the annealing temperature increased to 300?,the photoelectric performance of the film drops sharply.
Keywords/Search Tags:D/M/D multi-layer composite film, deposition rate, deposition atmosphere, surface roughness, transparent conductivity, film stability
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