Study On The Design,Preparation And Performance Of UV Photo-Stripping Composition

The characteristics of the photo-removable material require that it can play the role of bonding and fixing electronic components before light exposure,and later can be exposed to light to make it lose its viscosity or ablate,thus playing the role of peeling the substrate and the adhesive layer.In recent years,many companies at home and abroad have been conducting research in this area,and have developed rapidly in terms of product performance,output,variety,etc.,and have been promoted and applied to instruments,meters,electronics,automobiles and other industries,used in monocrystalline silicon,Optical glass and other precision processing of various photoelectric materials.At present,with the rapid development of flexible display and micro LED technology,it has broad development prospects to open up the domestic and foreign markets of this photo-stripped material.Therefore,this thesis designed two kinds of UV photo-stripping compositions:1.Photo-stripping type photosensitizer/nano-silver polymer composite material;2.High-temperature-resistant laser ablatable polymer/nano-silver composite material,studied Their composition,preparation method,photothermal properties and peeling mechanism.The main contents include:1.Preparation and performance study of photo-peelable photosensitizer/nano-silver polymer composite material:taking ternary chloroacetate polymer as the main resin,adding photosensitizer azobisisobutyronitrile and filler nano-silver particles to prepare a A compound film of chlorinated vinegar resin/azobisisobutyronitrile/nano silver with photosensitive properties.Azobisisobutyronitrile will rapidly decompose under ultraviolet light to produce nitrogen to accelerate the peeling of the polymer film from the substrate,and nano silver can reach the pre-melting point in a very short time,store and quickly release a lot of heat,The film will be ablated and peeled off quickly without affecting the substrate.In this experiment,the photosensitive and thermal properties of this composite film were studied.By studying the ablation process of composite films with different contents of nano silver and azobisisobutyronitrile,the optimal composition ratio of composite films was determined.Finally,the photo-stripping process and mechanism of the best composite film are further studied.2.Preparation and performance study of high temperature resistant laser ablatable polymer/nanometer silver composite material:polyimide synthesized with 1.2.4.5-pyromellitic dianhydride and 4,4'-diaminodiphenyl ether Acid prepolymer,and then adding nano silver particles to the above prepolymer to prepare a photo-stripping composite film with high temperature resistance.The imidization process of polyimide was studied by infrared spectroscopy.The existence of nano-silver particles on the surface of the composite film was confirmed by XRD analysis,and the dispersion of the nano-silver particles was characterized by SEM analysis.According to the photo-ablation and heat resistance(TGA analysis)of nano-silver composite films with different contents,the optimal content of nano-silver was determined.Finally,the photo-stripping process and mechanism of the composite film were further studied.