Research On The Temperature Characteristics Of Spatial Atomic Layer Deposition System

Spatial Atomic Layer Deposition(SALD)is a nano-thin films fabrication technology with high controllability thickness,uniformity and step coverage because of its self-limiting deposition characteristic.SALD technology breaks through the isolation of precursors in time-separated,realizes the continuous deposition with high efficiency,low cost and batch under normal pressure.The temperature of substrate is an important parameter of SALD,which will directly affect the quality of the deposited films.In this thesis,the SALD system acts as object of study,controling the stability and uniformity of the substrate temperature is the goal,and improving the efficiency of film deposition and film quality are the ultimate goal.The main works of this thesis includes:(1)For the contact heating SALD equipment,the temperature fluctuation of substrate is significantly reduced by temperature compensating of the substrate heater,and the uniformity of the temperature distribution of the substrate is improved by heating the nozzle.Furthermore,the heating process of the heater and the nozzle is optimized,and the measurement point of feedback temperature is discussed.(2)Aiming at the fabrication of laminated film,an automatically controlled temperature converter is designed.The influence of each control and process parameter on the controlled temperature change speed is studied experimentally and its optimal value is determined.Comparing the experimental data with that in the literature,the results show that the self-designed converter has good performance,which is helpful to improve the efficiency of thin film deposition.(3)Aiming at the requirement of large area substrate transfer in different reaction areas,the substrate transfer device based on the cylinder lifting table and the ball screw slide table is designed.In order to reduce the heating time after the substrate enters the reaction area and improve the film preparation efficiency,the radiation preheating zone is integrated on the transfer device.The temperature characteristics of the substrate transfer device preheating zone are studied.The temperature characteristics of the radiant heating and the contact heating are compared,and the advantages and disadvantages of the different heating methods are clarified,which can provide guidance for the design of next generation SALD heating system.