Error Analysis And Virtual Prototype Modeling And Control Of Scanning Interference Lithography Based On ZEMAX

Large-caliber high-precision planar gratings have important applications in high-end lithography machine workpiece tables,large-scale telescopes,and laser pulse compressors.Scanning interference lithography is the key to making such gratings.The key to improving the exposure accuracy is how to suppress the error caused by the drift of the exposure pattern.In this thesis,a simulation method based on ZEMAX for phase-shifting locking system is proposed.The integrated assembly error and the phase shift error of interference pattern caused by disturbance are simulated and analyzed.The method is easy to model and has strong versatility.The advantages of dynamic signal simulation,etc.,finally completed the integrated assembly and adjustment work of the whole machine and carried out the phase shift lock control experiment.The specific research work is as follows:Firstly,based on the principle of scanning interference lithography based on heterodyne phase shift locking system,the principle of heterodyne interferometry,the principle of frequency shift phase adjustment and the phase measurement interferometer scheme used in the experiment are expounded.The influence of exposure precision is analyzed.The main error sources are the general analysis of the integration error of the whole machine,the refractive index fluctuation of the air,and the phase drift error caused by the vibration of the optical component.Secondly,in order to determine the adjustment accuracy index of each optical device,it provides guidance for the integration and adjustment of the whole machine.The scanning interference lithography optical system is modeled by ZEMAX software,and the adjustment error of each optical component and module is analyzed.The influence of the graphics,the rough and fine adjustment error indicators were determined and verified.On this basis,the whole machine integrated assembly experiment was carried out,and the division of the machine completed the assembly and adjustment work of the whole machine.The main indicators met the design requirements.Then,an optical simulation model of the phase measurement interferometer is established to analyze the fluctuation of the refractive index of the air and the fringe phase drift caused by the vibration of the optical element.A simulation of the refractive index of the air and the vibration of the optical component affecting the fringe phase based on MATLAB and ZEMAX are proposed.The method and the feasibility of the simulation method are verified,and the random disturbance simulation input is provided for the subsequent virtual prototype of the control system.Finally,in order to suppress the fringe drift error caused by the disturbance,the model identification and controller design of the stripe locking control system were carried out,and the stripe locking control experiment was carried out.The locking precision reached the design expectation.Based on the previous simulation analysis,the construction was established.The ZEMAX-based control system virtual prototype and verified the feasibility of the simulation.