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Research Of Uniform Flow In A Filtration And Purification Chamber Under Different Deflectors

Posted on:2020-11-07Degree:MasterType:Thesis
Country:ChinaCandidate:H LiuFull Text:PDF
GTID:2392330596998297Subject:Architecture and Civil Engineering
Abstract/Summary:PDF Full Text Request
With the increasing emphasis on “protect environment” and air pollution control,China governments have continuously raised criterions for corporate pollutant emissions,and the treatment and discharge of various pollutants has become more stringent.For example,new pollutant discharge criterions were published in Shanghai in 2015,requiring pollutants in various industrial plants to meet new concentration limits.Therefore,filtration and purification equipment in industrial plants are increasingly demanding in the treatment of pollutants.However,under actual circumstances,due to the limitations of the structural design of the filtration and purification device itself,coupled with the constraints of the reforming conditions such as limited physical space,the internal flow field distribution of the filtration and purification device is uneven,resulting in a filter adsorption material for treating pollutants inside the device.The service life and life span are not uniform,which affects the service life and work efficiency of the whole filter material.Therefore,it is necessary to study the problem of flow field uniformity inside the filtration purification device.In this paper,a filter purification device is taken as the research object,and the internal flow field uniformity of the filter purification device is numerically simulated by using CFD calculation fluid dynamics simulation software Ansys Fluent 19.2.Firstly,the simulation model is established and the correctness of the model calculation results is verified.The spatial flow field distribution of the filtration and purification materials in the filtration and purification device is studied,and the cause of the RMS value of the internal flow field in the Z direction is found.Influence the law.Secondly,the influence of the air inlet structure of the device on the uniformity of VOCs gas is designed.Three device structures are designed:(1)adding a deflector,changing the parameters such as the size and shape of the deflector,and studying the airflow uniformity of the device space.(2)change the structure parameters of the air inlet position,cavity height;(3)change the position of the air outlet.Finally,using the orthogonal experiment method,the four factors affecting the flow field uniformity of the filter purification device(the number of deflectors,the length of the deflector,the height of the upper box,and the position of the outlet)are simulated and analyzed,and the flow field uniformity is affected.Factors are ranked in good or bad.The research results show that 11 arc-shaped deflectors with a length of 100 mm are added to the filter air inlet,and the flow field uniformity of the cavity inside the device is the best.At the same time,the height of the upper tank is appropriately increased,and the uniformity of the flow field is better.After the improved filtration and purification device,the root mean square value of the Z-direction velocity on the plane near the near-filtration purification material is reduced by about 76% compared with the initial working condition,and the flow field uniformity is well improved.
Keywords/Search Tags:filtration and purification device, deflector, airflow distribution, flow field uniformity, numerical simulation
PDF Full Text Request
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