Research On The Influence Of Surface Textureon The Photoelectric Characteristics Of Monocrystalline Silicon Solar Cell

Monocrystalline silicon solar cells occupy approximately 90% of the worldwide market share in the photovoltaic industry due to their low cost and high photoelectric conversion efficiency.To improve the photoelectric conversion efficiency of monocrystalline silicon solar cells,how to improve the absorption rate of the monocrystalline silicon solar cells and enhance the photovoltaic effect has been a research focus.This paper focuses on the influence of surface texture on the photoelectric characteristics of monocrystalline silicon cells and the improvement of photoelectric conversion efficiency.Firstly,a quantitative characterization parameter was proposed to quantitatively characterize the uniformity of pyramid texture on the surface of monocrystalline silicon cell.Then,the process parameters were optimized by using the characteristic parameters,and the monocrystalline silicon cell with higher photoelectric conversion efficiency was obtained.However,the bottom and the top of the pyramid on the surface of monocrystalline silicon cell are easy to produce defects due to thermal stress.Finally,the pyramid texture on the surface of monocrystalline silicon cell was rounded to enhance the photovoltaic effect of the cell,and the photoelectric conversion efficiency of the monocrystalline silicon cell was further improved.This paper conducts research from the following aspects:(1)The growth characteristics of the pyramid in the texture process of monocrystalline silicon were analyzed.ANSYS was used to simulate the influence of the pyramidal textured thermal stress distribution of the monocrystalline silicon cell under high temperature diffusion.The relative standard deviation Sh of pyramid texture height is defined by referring to the standard deviation in mathematical statistics,which can effectively quantify the uniformity of the pyramid texture on the surface of the monocrystalline silicon cell.(2)Different process parameters were used for chemical texturing of monocrystalline silicon wafers,and Sh was used to quantitatively characterize the uniformity of the pyramidal textures.The experimental results indicated that better uniformity of the pyramidal texture led to a smaller Sh and a higher photoelectric conversion efficiency.The photoelectric properties of monocrystalline silicon cell and the uniformity of pyramid texture have obvious corresponding relation.By fitting the relative standard deviation Sh curve to optimize the time of texturing,the best uniformity of the pyramid texture was obtained,and the photoelectric conversion efficiency increased to 19.76%.(3)The defects of the pyramid texture were detected and the thermal stress was analyzed by simulation in the manufacturing process of the monocrystalline silicon cell,which revealed the mechanism of the photovoltaic effect of monocrystalline silicon cells.The simulation results show that the monocrystalline silicon cells rounded the pyramid bottom,tower top and edges,and its thermal stress decreased significantly during high temperature diffusion.The photovoltaic effect of monocrystalline silicon cell can be enhanced by the smooth processing with HF acid solution.In the experiment,a monocrystalline silicon cell with moderate pyramid rounding rate is obtained,which can take into account the absorption rate and photovoltaic effect of the monocrystalline silicon cell at the same time,and the photoelectric conversion efficiency of the obtained monocrystalline silicon cell reaches the maximum value of 20.03%.Based on the above research,an effective method for quantifying the pyramid textured uniformity on the surface of monocrystalline silicon cell was proposed.The characterization method was used to optimize the texturing process of the monocrystalline silicon cell,which effectively improved the photoelectric conversion efficiency of the monocrystalline silicon cell.The process optimized cell was further rounded,the monocrystalline silicon cell with the best photoelectric conversion efficiency can be obtained.The results of this paper provide an effective method for the optimization of the texturing process in industrial production,and propose a rounding process to improve the photoelectric conversion efficiency of the monocrystalline silicon cells.