Synthesis of silicon and germanium nanowires and silicon/germanium nanowire heterostructures

The vapor-liquid-solid growth process for synthesis of group-IV semiconducting nanowires using silane, germane, disilane and digermane precursor gases has been investigated. The nanowire growth process combines in situ gold seed formation by vapor deposition on atomically clean silicon (111) surfaces, in situ growth from the gaseous precursor(s), and real-time monitoring of nanowire growth as a function of temperature and pressure by a novel optical reflectometry technique. A significant dependence on precursor pressure and growth temperature for the synthesis of silicon and germanium nanowires is observed, depending on the stability of the specific precursor used. Also, the presence of a nucleation time for the onset of nanowire growth has been found using our new in situ optical reflectometry technique. Thermal annealing of the deposited gold seeds prior to nanowire growth is shown to lead to ripening of the gold seeds and the formation of pillars several nanometers in height under the seeds. These pillars are demonstrated to result from the catalytic collection of surface Si adatoms and provide a method to obtain 100% vertical growth of nanowires on Si (111) substrates. The growth of nanowire heterostructures has also been investigated with specific attention paid to the strain induced within these structures. Strain in axial and core-shell Si/Ge nanowire heterostructures provides a unique opportunity for modifying bandstructures of specific nanoscale heterostructures. Specific precursor selection adds an additional control by which we are able to grow specific heterostructures---axial or core-shell. Axial heterowires form more easily by catalyzing silane at the Au eutectic seed, while core-shell heterowires grow more easily by stabilizing lateral growth using disilane or digermane. Strain mapping of nanowires based on geometric phase analysis of high-resolution transmission electron microscopy lattice imaging reveals large strains present in core-shell Si/Ge nanowires. Quantitative comparisons to finite element, continuum elasticity modeling correlates well with the strain mapping. The core-to-shell diameter ratio determines the relative strain between the core and shell; strain partitioning provides the opportunity to use this ratio for strain engineering the electronic properties of the nanowire heterostructure. Additional discussion of nanowire patterning and potential applications for such devices are also presented.